Sputtering-induced vacancy cluster formation on TiO{sub 2}(110)
Journal Article
·
· Physical Review. B, Condensed Matter and Materials Physics
- Department of Physics and Astronomy, University of California, Riverside, California 92521 (United States)
Defects are introduced on an atomically clean TiO{sub 2}(110) surface in a controllable manner via bombardment by 0.5 keV Ar{sup +} ions, and the resultant material is probed with scanning tunneling microscopy and x-ray photoelectron spectroscopy. It is shown that ion bombardment leads to a change of stoichiometry and the formation of vacancy clusters, while annealing after prolonged bombardment forms regular rectangular cavities with single-atomic-layer steps. It is concluded that curvature-dependent sputtering in combination with adatom and vacancy diffusion is responsible for the observed structures.
- OSTI ID:
- 21052775
- Journal Information:
- Physical Review. B, Condensed Matter and Materials Physics, Journal Name: Physical Review. B, Condensed Matter and Materials Physics Journal Issue: 19 Vol. 76; ISSN 1098-0121
- Country of Publication:
- United States
- Language:
- English
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