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Title: Beamlines on Indus-1 and Indus-2 for X-ray Multilayer Optics and Micro Fabrication Research

Abstract

A soft X-ray/extreme ultra violet (EUV) reflectometry beamline is operational at Indus-1 synchrotron source. The beamline is used for the characterization of multilayer optics for EUV lithography. A soft/deep X-ray lithography beamline is being set up on Indus-2, for undertaking research activities on micro electro mechanical systems (MEMS) and sub micron X-ray lithography structures. Present status of these beamlines is presented.

Authors:
; ; ; ; ;  [1]
  1. Synchrotron Utilisation and Material Research Division, Raja Ramanna Centre for Advanced Technology, Indore-452 013 (India)
Publication Date:
OSTI Identifier:
21049301
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 879; Journal Issue: 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436343; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; BEAM PRODUCTION; ELECTROMECHANICS; FABRICATION; INDUS-1; INDUS-2; LAYERS; MICROSTRUCTURE; OPTICS; SOFT X RADIATION; ULTRAVIOLET RADIATION

Citation Formats

Lodha, G. S., Dhamgaye, V. P., Modi, M. H., Nayak, M., Sinha, A. K., and Nandedkar, R. V. Beamlines on Indus-1 and Indus-2 for X-ray Multilayer Optics and Micro Fabrication Research. United States: N. p., 2007. Web. doi:10.1063/1.2436343.
Lodha, G. S., Dhamgaye, V. P., Modi, M. H., Nayak, M., Sinha, A. K., & Nandedkar, R. V. Beamlines on Indus-1 and Indus-2 for X-ray Multilayer Optics and Micro Fabrication Research. United States. doi:10.1063/1.2436343.
Lodha, G. S., Dhamgaye, V. P., Modi, M. H., Nayak, M., Sinha, A. K., and Nandedkar, R. V. Fri . "Beamlines on Indus-1 and Indus-2 for X-ray Multilayer Optics and Micro Fabrication Research". United States. doi:10.1063/1.2436343.
@article{osti_21049301,
title = {Beamlines on Indus-1 and Indus-2 for X-ray Multilayer Optics and Micro Fabrication Research},
author = {Lodha, G. S. and Dhamgaye, V. P. and Modi, M. H. and Nayak, M. and Sinha, A. K. and Nandedkar, R. V.},
abstractNote = {A soft X-ray/extreme ultra violet (EUV) reflectometry beamline is operational at Indus-1 synchrotron source. The beamline is used for the characterization of multilayer optics for EUV lithography. A soft/deep X-ray lithography beamline is being set up on Indus-2, for undertaking research activities on micro electro mechanical systems (MEMS) and sub micron X-ray lithography structures. Present status of these beamlines is presented.},
doi = {10.1063/1.2436343},
journal = {AIP Conference Proceedings},
number = 1,
volume = 879,
place = {United States},
year = {Fri Jan 19 00:00:00 EST 2007},
month = {Fri Jan 19 00:00:00 EST 2007}
}