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Title: Beamlines on Indus-1 and Indus-2 for X-ray Multilayer Optics and Micro Fabrication Research

Abstract

A soft X-ray/extreme ultra violet (EUV) reflectometry beamline is operational at Indus-1 synchrotron source. The beamline is used for the characterization of multilayer optics for EUV lithography. A soft/deep X-ray lithography beamline is being set up on Indus-2, for undertaking research activities on micro electro mechanical systems (MEMS) and sub micron X-ray lithography structures. Present status of these beamlines is presented.

Authors:
; ; ; ; ;  [1]
  1. Synchrotron Utilisation and Material Research Division, Raja Ramanna Centre for Advanced Technology, Indore-452 013 (India)
Publication Date:
OSTI Identifier:
21049301
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 879; Journal Issue: 1; Conference: 9. international conference on synchrotron radiation instrumentation, Daegu (Korea, Republic of), 28 May - 2 Jun 2006; Other Information: DOI: 10.1063/1.2436343; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; BEAM PRODUCTION; ELECTROMECHANICS; FABRICATION; INDUS-1; INDUS-2; LAYERS; MICROSTRUCTURE; OPTICS; SOFT X RADIATION; ULTRAVIOLET RADIATION

Citation Formats

Lodha, G. S., Dhamgaye, V. P., Modi, M. H., Nayak, M., Sinha, A. K., and Nandedkar, R. V. Beamlines on Indus-1 and Indus-2 for X-ray Multilayer Optics and Micro Fabrication Research. United States: N. p., 2007. Web. doi:10.1063/1.2436343.
Lodha, G. S., Dhamgaye, V. P., Modi, M. H., Nayak, M., Sinha, A. K., & Nandedkar, R. V. Beamlines on Indus-1 and Indus-2 for X-ray Multilayer Optics and Micro Fabrication Research. United States. doi:10.1063/1.2436343.
Lodha, G. S., Dhamgaye, V. P., Modi, M. H., Nayak, M., Sinha, A. K., and Nandedkar, R. V. Fri . "Beamlines on Indus-1 and Indus-2 for X-ray Multilayer Optics and Micro Fabrication Research". United States. doi:10.1063/1.2436343.
@article{osti_21049301,
title = {Beamlines on Indus-1 and Indus-2 for X-ray Multilayer Optics and Micro Fabrication Research},
author = {Lodha, G. S. and Dhamgaye, V. P. and Modi, M. H. and Nayak, M. and Sinha, A. K. and Nandedkar, R. V.},
abstractNote = {A soft X-ray/extreme ultra violet (EUV) reflectometry beamline is operational at Indus-1 synchrotron source. The beamline is used for the characterization of multilayer optics for EUV lithography. A soft/deep X-ray lithography beamline is being set up on Indus-2, for undertaking research activities on micro electro mechanical systems (MEMS) and sub micron X-ray lithography structures. Present status of these beamlines is presented.},
doi = {10.1063/1.2436343},
journal = {AIP Conference Proceedings},
number = 1,
volume = 879,
place = {United States},
year = {Fri Jan 19 00:00:00 EST 2007},
month = {Fri Jan 19 00:00:00 EST 2007}
}
  • X-ray lithography is an ideal technique by which high aspect ratio and high spatial resolution micro/nano structures are fabricated using X-rays from synchrotron radiation source. The technique has been used for fabricating optics (X-ray, visible and infrared), sensors and actuators, fluidics and photonics. A beamline for X-ray lithography is operational on Indus-2. The beamline offers wide lithographic window from 1-40keV photon energy and wide beam for producing microstructures in polymers upto size ∼100mm × 100mm. X-ray exposures are possible in air, vacuum and He gas environment. The air based exposures enables the X-ray irradiation of resist for lithography and alsomore » irradiation of biological and liquid samples.« less
  • Poor knowledge of optical constants of various materials in the soft x-ray region requires to test the soft x-ray optical devices at actual wavelengths. For such purposes a soft x-ray/vacuum ultraviolet reflectivity beamline has been setup on Indus-1 synchrotron.X-ray multilayer structures are also being developed at RRCAT. Silicon based different multilayer optics fabricated in house for 100-200A ring wavelength region show a very high reflectivity performance. A new multilayer combination comprised of NbC/Si is proposed for achieving good thermal stability high reflectivity in the Si L-edge region. A high reflectivity of 63% in near normal incidence region is obtained withmore » a sputter deposited Mo/Si combination. Results prospects of growing NbC/Si multilayer are presented.« less
  • X-ray compound refractive lenses (CRL) have been fabricated using Soft and Deep X-ray lithography (SDXRL) beamline on Indus-2. Upto 50 parabolic lenses are fabricated in PMMA using 1X X-ray mask. The mask contains of 20 micron thick gold absorbing pattern on polyimide membrane. The lens fabrication is done by exposing 500 {mu}m thick PMMA sheets to 5-12keV X-rays from Indus-2. The fabricated CRL will be suitable for generating focused X-ray beam of Indus-2 bending magnet source.
  • We discuss the procedures developed for the production and testing of multilayer x-ray mirrors on large figured optical surfaces. Methods which are generally useful for characterizing the performance of such optics are presented, as well as specific results from the production of a 25-cm diam Ritchey-Chretien telescope for a wavelength of /Sigma/ = 63.5 A. The latter is a two-mirror system, which places additional stringent requirements upon the accuracy and quality of the coatings.
  • Transmissive multilayer optics have a potential application in the development of high-resolution x-ray microscope and spectrometer systems. Difficulties encountered in the sputter deposition of these multilayer optical structures can be overcome by careful control of the fabrication parameters. The deleterious effects of compressive or tensile intrinsic stresses can be minimized by optimizing both substrate temperature and working gas pressure during the deposition process. This study specifically considers the Al/Ta multilayer combination.