Lithium phosphorous oxynitride films synthesized by a plasma-assisted directed vapor deposition approach
- Department of Material Science and Engineering, School of Engineering and Applied Science, University of Virginia, 395 McCormick Road, Charlottesville, Virginia 22904 (United States)
A plasma-assisted directed vapor deposition approach has been explored for the synthesis of lithium phosphorous oxynitride (Lipon) thin films. A Li{sub 3}PO{sub 4} source was first evaporated using a high voltage electron beam and the resulting vapor entrained in a nitrogen-doped supersonic helium gas jet and deposited on a substrate at ambient temperature. This approach failed to incorporate significant concentrations of nitrogen in the films. A hollow cathode technique was then used to create an argon plasma that enabled partial ionization of both the Li{sub 3}PO{sub 4} vapor and nitrogen gas just above the substrate surface. The plasma-enhanced deposition process greatly increased the gas phase and surface reactivity of the system and facilitated the synthesis and high rate deposition of amorphous Lipon films with the N/P ratios between 0.39 and 1.49. Manipulation of the plasma-enhanced process conditions also enabled control of the pore morphology and significantly affected the ionic transport properties of these films. This enabled the synthesis of electrolyte films with lithium ion conductivities in the 10{sup -7}-10{sup -8} S/m range. They appear to be well suited for thin-film battery applications.
- OSTI ID:
- 21020899
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 26, Issue 1; Other Information: DOI: 10.1116/1.2823491; (c) 2008 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
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