Effect of thickness on the structural, electrical and optical properties of ZnO films

Journal Article · Thu May 03 04:00:00 EDT 2007 · Materials Research Bulletin

DOI:https://doi.org/10.1016/j.materresbull.2006.08.019· OSTI ID:21000635

Mridha, S ^[1]; Basak, D ^[1]

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1. Department of Solid State Physics, Indian Association for the Cultivation of Science, Jadavpur, Kolkata 700032 (India)

A series of ZnO films of different thickness have been deposited on glass substrates using sol-gel technique by varying the number of spin coatings and the effect of film thickness on the structural, electrical and optical properties have been investigated. The XRD results indicate that the full width at half maximum (FWHM) of the (0 0 2) diffraction peak and the strain along c-axis are decreased as the film is grown up to a thickness of 300 nm. Above 300 nm, the strain again becomes appreciable. The surface morphology shows that the grains become more uniform and bigger in size as the film thickness increases. Electrical result shows that although ZnO film with thickness of around 260 nm has the highest resistivity but is better for current conduction. The excitonic nature in the absorption spectrum becomes prominent for a film with thickness of around 260 nm. The band gap increases and then decreases as the film grows thicker.

• OSTI ID: 21000635
• Journal Information: Materials Research Bulletin, Journal Name: Materials Research Bulletin Journal Issue: 5 Vol. 42; ISSN MRBUAC; ISSN 0025-5408
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ABSORPTION SPECTRA
COATINGS
ELECTRICAL PROPERTIES
FILMS
GLASS
MORPHOLOGY
OPTICAL PROPERTIES
SOL-GEL PROCESS
SPIN
SUBSTRATES
THICKNESS
X-RAY DIFFRACTION
ZINC OXIDES