Optimization of the microcrystalline silicon deposition efficiency

Journal Article · Sun Jul 15 00:00:00 EDT 2007 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.2433985· OSTI ID:20979477

Strahm, B; Howling, A A; Sansonnens, L; Hollenstein, Ch ^[1]

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1. Ecole Polytechnique Federale de Lausanne (EPFL), Centre de Recherches en Physique des Plasmas, CH-1015 Lausanne (Switzerland)

Cost reduction constraints for microcrystalline silicon thin film photovoltaic solar cells require high deposition rates and high silane gas utilization efficiencies. If the requirements in deposition rate have sometimes been fulfilled, it is generally not the case for the silane utilization. In this work, a reactor-independent methodology has been developed to determine the optimum plasma parameters in terms of deposition rate, silane utilization, and material microstructure. Using this optimization method, a microcrystalline layer has been deposited over a large area at a rate of 10.9 A/s, with a silane utilization efficiency above 80%.

• OSTI ID: 20979477
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 4 Vol. 25; ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CRYSTAL STRUCTURE
DEPOSITION
EFFICIENCY
LAYERS
MICROSTRUCTURE
OPTIMIZATION
PHOTOVOLTAIC EFFECT
PLASMA
SEMICONDUCTOR MATERIALS
SILANES
SILICON
SOLAR CELLS
THIN FILMS