Plasma-assisted atomic layer deposition of Al{sub 2}O{sub 3} moisture permeation barriers on polymers
- Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven (Netherlands)
Thin Al{sub 2}O{sub 3} films of different thicknesses (10-40 nm) were deposited by plasma-assisted atomic layer deposition on substrates of poly(2,6-ethylenenaphthalate) (PEN), and the water vapor transmission rate (WVTR) values were measured by means of the calcium test. The permeation barrier properties improved with decreasing substrate temperature and a good WVTR of 5x10{sup -3} g m{sup -2} day{sup -1} (WVTR{sub PEN}=0.5 g m{sup -2} day{sup -1}) was measured for a 20 nm thick Al{sub 2}O{sub 3} film deposited at room temperature using short purging times. Such ultrathin, low-temperature deposited, high-quality moisture permeation barriers are an essential requirement for the implementation of polymeric substrates in flexible electronic and display applications.
- OSTI ID:
- 20883178
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 8 Vol. 89; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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