Anisotropic broadening of Cu nanorods during glancing angle deposition

Journal Article · Mon Nov 13 00:00:00 EST 2006 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2388861· OSTI ID:20880155

Kesapragada, S V; Gall, D ^[1]

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1. Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180 (United States)

Regular arrays of freestanding Cu nanostructures were grown on patterned Si substrates using glancing angle deposition (GLAD) from two oppositely positioned sputtering sources. Continuous azimuthal substrate rotation during deposition leads to the formation of vertical 430-nm-wide rods, which broaden anisotropically during subsequent growth with a stationary substrate. Statistical analyses of plan-view micrographs combined with numerical simulations indicate a linear increase in the width aspect ratio with deposition time that is attributed to a change in the growth front direction. This technique, termed simultaneous opposite GLAD, provides a unique approach for nanostructure shaping.

• OSTI ID: 20880155
• Journal Information: Applied Physics Letters, Vol. 89, Issue 20; Other Information: DOI: 10.1063/1.2388861; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANISOTROPY
ASPECT RATIO
COPPER
CRYSTAL GROWTH
DEPOSITION
NANOSTRUCTURES
ROTATION
SIMULATION
SPUTTERING
SUBSTRATES