Temperature threshold for nanorod structuring of metal and oxide films grown by glancing angle deposition

Journal Article · Sat Jan 15 00:00:00 EST 2011 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.3525882· OSTI ID:22054016

Deniz, Derya; Lad, Robert J ^[1]

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1. Laboratory for Surface Science and Technology, University of Maine, Orono, Maine 04469-5708 (United States)

Thin films of tin (Sn), aluminum (Al), gold (Au), ruthenium (Ru), tungsten (W), ruthenium dioxide (RuO{sub 2}), tin dioxide (SnO{sub 2}), and tungsten trioxide (WO{sub 3}) were grown by glancing angle deposition (GLAD) to determine the nanostructuring temperature threshold, {Theta}{sub T}, above which adatom surface diffusion becomes large enough such that nanorod morphology is no longer formed during growth. The threshold was found to be lower in metals compared to oxides. Films were grown using both dc and pulsed dc magnetron sputtering with continuous substrate rotation over the temperature range from 291 to 866 K. Film morphologies, structures, and compositions were characterized by high resolution scanning electron microscopy, x-ray diffraction, and x-ray photoelectron spectroscopy. Films were also grown in a conventional configuration for comparison. For elemental metals, nanorod structuring occurs for films with melting points higher than that of Al (933 K) when grown at room temperature with a rotation rate of {approx}5 rpm, corresponding to a value of {Theta}{sub T}{approx_equal}0.33{+-}0.01. For the oxide films, a value of {Theta}{sub T}{approx_equal}0.5 was found, above which GLAD nanorod structuring does not occur. The existence of a nanostructuring temperature threshold in both metal and oxide GLAD films can be attributed to greater adatom mobilities as temperature is increased resulting in nonkinetically limited film nucleation and growth processes.

• OSTI ID: 22054016
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 29, Issue 1; Other Information: (c) 2011 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM
CRYSTAL GROWTH
DEPOSITION
GOLD
MAGNETRONS
MELTING POINTS
NANOSTRUCTURES
NUCLEATION
PARTICLE MOBILITY
RUTHENIUM
RUTHENIUM OXIDES
SCANNING ELECTRON MICROSCOPY
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
TIN OXIDES
TUNGSTEN OXIDES
X-RAY DIFFRACTION
X-RAY PHOTOELECTRON SPECTROSCOPY