Iron silicides grown by solid phase epitaxy on a Si(111) surface: Schematic phase diagram
- Graduate School of Materials Science, Nara Institute of Science and Technology (NAIST), Ikoma, Nara 630-0192 (Japan)
- UNISOKU Co., Ltd., Hirakata, Osaka 573-0131 (Japan)
We have determined the schematic phase diagram in detail with high reliability for Fe silicides grown by solid phase epitaxy (SPE) on a Si(111)7x7 surface at wide Fe coverage (0.2-56 monolayers) and subsequent annealing temperatures from 300 to 800 deg. C. In the SPE growth, {delta}-7x7, 1x1, bcc-Fe(111)1x1, 2x2, c(8x4), 3D-2x2 ({alpha}-FeSi{sub 2}), {radical}(3)x{radical}(3)-R30 deg., {beta}-FeSi{sub 2}, and fine polycrystalline phases are formed on the Si(111) surface depending on Fe coverage and annealing temperature. We have characterized the surface periodic structures and morphologies of all the above Fe silicide phases using low-energy electron diffraction and scanning tunneling microscopy. Reflection high-energy electron diffraction also has been used to determine three-dimensional structures. Based on the overall view regarding the formations and changes of Fe silicide phases on a Si(111) surface, we discuss the growth mechanisms.
- OSTI ID:
- 20853770
- Journal Information:
- Physical Review. B, Condensed Matter and Materials Physics, Vol. 74, Issue 15; Other Information: DOI: 10.1103/PhysRevB.74.155406; (c) 2006 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1098-0121
- Country of Publication:
- United States
- Language:
- English
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