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Photoemission studies of Ti{sub 3}SiC{sub 2} and nanocrystalline-TiC/amorphous-SiC nanocomposite thin films

Journal Article · · Physical Review. B, Condensed Matter and Materials Physics
; ; ;  [1]; ;  [2]
  1. Thin Film Physics Division, Department of Physics, Chemistry, and Biology, IFM, Linkoeping University, S-581 83 Linkoeping (Sweden)
  2. Materials Physics Division, Department of Physics, Chemistry, and Biology, IFM, Linkoeping University, S-581 83 Linkoeping (Sweden)
Photoemission studies using synchrotron radiation have been performed on epitaxial Ti{sub 3}SiC{sub 2}(0001) and compound nanocrystalline (nc-)TiC/amorphous (a-)SiC thin films deposited by magnetron sputtering. As-introduced samples were found to be covered by surface oxides, SiO{sub x} and TiO{sub x}. These oxides could be removed by in-situ annealing to {approx}1000 deg. C. For as-annealed Ti{sub 3}SiC{sub 2}(0001), surface Si was observed and interpreted as originating from decomposition of Ti{sub 3}SiC{sub 2} through Si out-diffusion. For nc-TiC/a-SiC annealed in situ to {approx}1000 deg. C, the surface instead exhibited a dominant contribution from graphitic carbon, also with the presence of Si, due to C and Si out-diffusion from the a-SiC compound or from grain boundaries.
OSTI ID:
20853352
Journal Information:
Physical Review. B, Condensed Matter and Materials Physics, Journal Name: Physical Review. B, Condensed Matter and Materials Physics Journal Issue: 4 Vol. 74; ISSN 1098-0121
Country of Publication:
United States
Language:
English