Ion scattering and electron spectroscopy of the chemical species at a HF-prepared Si(211) surface
- U.S. Army Research, Development and Engineering Command (RDECOM) Communications-Electronics Research, Development and Engineering Center (CERDEC), Night Vision and Electronic Sensors Directorate - NVESD, 10221 Burbeck Road, Fort Belvior, Virginia 22060-5806 (United States)
The species and the nature of their chemical bonds at the surface of a hydrogen-terminated Si(211) wafer were characterized using temperature desorption spectroscopy, ion scattering spectroscopy, and electron spectroscopy. The surface region is dominated by monohydride species with dihydrides present in small amounts. Fluorine is distributed across the top layer as largely a physisorbed species to the Si substrate. Low-energy {sup 3}He{sup +} ions remove the H and F species with only minimal damage to the underlying region.
- OSTI ID:
- 20778623
- Journal Information:
- Applied Physics Letters, Vol. 88, Issue 3; Other Information: DOI: 10.1063/1.2166682; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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