Evolution of film temperature during magnetron sputtering

Journal Article · Sat Jul 15 04:00:00 EDT 2006 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.2210947· OSTI ID:20777307

Shaginyan, L R; Han, J G; Shaginyan, V R; Musil, J ^[1]

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1. Institute for Materials Science Problems, National Academy of Sciences of Ukraine, Krzhizhanovsky Street, 3, Kiev 03142, Ukraine and Center for Advanced Plasma Surface Technology, SungKyunKwan University, 300 Chun-Chun-Dong, Jangan-gu, Suwon 440-746 (Korea, Republic of)

We report on the results of measurements of the temperature T{sup F}{sub surf} which developed on the surface of films deposited by magnetron sputtering of chromium and copper targets on cooling and non-cooling silicon substrates. The T{sup F}{sub surf} and substrate temperature (T{sub s}) were simultaneously measured using high-resolution IR camera and thermocouple, respectively. We revealed that the T{sup F}{sub surf} steeply grows, keeps constant when it achieves saturation level, and rapidly drops to the value of the T{sub s} after stopping the deposition. At the same time, the T{sub s} either does not change for the case of cooling substrate or increases to a certain level for noncooling substrate. However, in both cases the T{sub s} remains several times lower than the T{sup F}{sub surf}. The T{sup F}{sub surf} is proportional to the flux of energy delivered to the growth surface by sputtered atoms and other fast particles, weakly depends on the depositing metal and can achieve several hundreds of deg. C. This phenomenon is explained by a model assuming formation of a hot thin surface layer (HTSL) on the top of the growing film, which exists only during film deposition and exhibits extremely low thermal conductivity. Due to this unique property the temperature T{sup F}{sub surf} of HTSL is several times higher than the T{sub s}. Variations in the T{sup F}{sub surf} fairly correlate with structure changes of Cr films along thickness investigated in detail previously.

• OSTI ID: 20777307
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 4 Vol. 24; ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CHROMIUM
COOLING
COPPER
DEPOSITION
MAGNETRONS
SILICON
SPUTTERING
SUBSTRATES
SURFACES
THERMAL CONDUCTIVITY
THIN FILMS