Particle-in-cell simulation of an electron shock wave in a rapid rise time plasma immersion ion implantation process
- Plasma Research Laboratory, Research School of Physical Sciences and Engineering, Australian National University, ACT 0200 (Australia)
A one-dimensional Monte Carlo collision-particle-in-cell plasma computer code was used to simulate plasma immersion ion implantation by applying a negative voltage pulse to the substrate while the reactor wall is grounded. The results presented here show the effect of short rise time pulses: for rise times shorter than the electron plasma period (typically 5 ns/kV), an electron shock wave is observed where a rapidly expanding sheath heats the electrons up to high energies. Many of these fast electrons are expelled from the plasma leading to a high plasma potential and thus to a high surface electric field on the earthed electrode which could give rise to non-negligible electron field emission.
- OSTI ID:
- 20736539
- Journal Information:
- Physics of Plasmas, Vol. 12, Issue 4; Other Information: DOI: 10.1063/1.1872894; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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