Synthesis of silicon nanocones using rf microplasma at atmospheric pressure

Journal Article · Mon Oct 03 04:00:00 EDT 2005 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2084342· OSTI ID:20709822

Shirai, H; Kobayashi, T; Hasegawa, Y ^[1]

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1. Department of Functional Materials Science, Faculty of Engineering, Saitama University, 255 Shimo-Okubo, Sakura, Saitama 338-8570 (Japan)

We report the synthesis of silicon nanocones using the rf microplasma discharge at atmospheric pressure. The products formed underneath the tube electrode on Fe-coated crystalline silicon were constituted mainly of silicon and silicon oxide despite the use of a methane-argon mixture. Carbon nanotubes and silicon nanowires were also formed around the silicon nanocones. The number density and average size of silicon nanocones increased with the plasma exposure time accompanied by the enlargement of their surface distribution. The growth mechanism of silicon nanocones is discussed in terms of the catalytic growth via diffusion of silicon with nanocrystalline Si particle through FeSi{sub x} nanoclusters, and enhanced Si oxidation by the plasma heating.

• OSTI ID: 20709822
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 14 Vol. 87; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ARGON
ATMOSPHERIC PRESSURE
CARBON
CATALYSTS
CRYSTAL GROWTH
DIFFUSION
ELECTRODES
METHANE
MIXTURES
NANOTUBES
OXIDATION
PLASMA
PLASMA HEATING
QUANTUM WIRES
SEMICONDUCTOR MATERIALS
SILICON
SILICON OXIDES
SYNTHESIS