Precise determination of band offsets and chemical states in SiN/Si studied by photoemission spectroscopy and x-ray absorption spectroscopy
- Department of Applied Chemistry, University of Tokyo, Bunkyo-ku, Tokyo 113-8656 (Japan)
We have investigated chemical states and band offsets in SiN/Si by photoemission spectroscopy and x-ray absorption spectroscopy. N 1s photoemission spectra in SiN for three kinds of layer-thickness films are fitted by a single component, suggesting that a nitrogen atom is surrounded by three silicon and nine nitrogen atoms for the first and the second nearest neighbor, respectively. Valence-band offsets between SiN and the Si substrates are determined to be 1.6 eV using valence-band spectra by subtracting the contribution from Si substrates. Band gap of SiN is estimated to be 5.6-5.7 eV from valence-band, N 1s core level, and N K-edge-absorption spectra. Furthermore, time-dependent measurements of N 1s photoemission spectra reveal that the x-ray irradiation time is a significant factor to determine the precise valence-band offsets excluding the differential charging effects.
- OSTI ID:
- 20709728
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 10 Vol. 87; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ABSORPTION SPECTRA
ABSORPTION SPECTROSCOPY
CHEMICAL STATE
ENERGY GAP
EV RANGE 01-10
FILMS
IRRADIATION
LAYERS
NITROGEN
PHOTOELECTRON SPECTROSCOPY
PHOTOEMISSION
SEMICONDUCTOR MATERIALS
SILICON
SILICON NITRIDES
SUBSTRATES
THICKNESS
TIME DEPENDENCE
VALENCE
X-RAY SPECTRA
X-RAY SPECTROSCOPY