Epitaxial PtMn/NiFe exchange-biased bilayers containing directly deposited ordered PtMn

Journal Article · Sun May 15 04:00:00 EDT 2005 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.1852440· OSTI ID:20709697

Choi, Young-suk; Petford-Long, Amanda K; Ward, Roger C.C. ^[1]

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1. Department of Materials, University of Oxford, Parks Road, Oxford, OX1 3PH (United Kingdom)

PtMn/NiFe exchange-biased bilayers have been grown epitaxially on Si (001) using molecular-beam epitaxy. Spontaneous formation of the chemically ordered face-centered-tetragonal phase of PtMn layer was confirmed without postgrowth magnetic-field annealing, whose Neel axis is perpendicular to the PtMn/NiFe interface. The exchange anisotropy field stabilizes above a PtMn thickness of 15 nm which is much lower than that for polycrystalline PtMn-based exchange-biased systems. For comparison, PtMn/NiFe exchange-biased bilayers have been prepared epitaxially on MgO (001) substrate. Spontaneous formation of the chemically ordered PtMn layer was also confirmed with Neel axis parallel to the PtMn/NiFe interface. The exchange anisotropy field of the bilayer on MgO stabilizes beyond a PtMn thickness of 15 nm as well.

• OSTI ID: 20709697
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 10 Vol. 97; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANISOTROPY
ANNEALING
ANTIFERROMAGNETIC MATERIALS
CRYSTAL GROWTH
EXCHANGE INTERACTIONS
FERROMAGNETIC MATERIALS
HYSTERESIS
INTERFACES
IRON ALLOYS
MAGNESIUM OXIDES
MAGNETIC FIELDS
MAGNETISM
MANGANESE ALLOYS
MOLECULAR BEAM EPITAXY
MORPHOLOGY
NEEL TEMPERATURE
NICKEL ALLOYS
PLATINUM ALLOYS
POLYCRYSTALS
SUBSTRATES