Growth of an {alpha}-Sn film on an InSb(111) A-(2x2) surface
Journal Article
·
· Physical Review. B, Condensed Matter and Materials Physics
- Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578 (Japan)
- Department of Applied Chemistry, Graduate School of Engineering, University of Tokyo, Tokyo 113-0033 (Japan)
- Department of Electronic Engineering/International Student Center, Tohoku University, Sendai 980-8578 (Japan)
We have investigated the initial growth process of {alpha}-Sn films on the In-terminated InSb(111)A-(2x2) surface using low-energy electron diffraction (LEED) and high-resolution core-level photoelectron spectroscopy. Taking the LEED observation and the Sn coverage-dependent integrated intensities of the In 4d, Sb 4d, and Sn 4d core-level spectra into account, we conclude that the {alpha}-Sn film grows epitaxially by a bilayer mode and that there is no interdiffusion of the substrate atoms as suggested in the literature. Furthermore, the coverage-dependent In 4d and Sn 4d core levels indicate that the In vacancy site of InSb(111)A-(2x2) surface is not the preferable Sn absorption site.
- OSTI ID:
- 20662279
- Journal Information:
- Physical Review. B, Condensed Matter and Materials Physics, Journal Name: Physical Review. B, Condensed Matter and Materials Physics Journal Issue: 23 Vol. 70; ISSN 1098-0121
- Country of Publication:
- United States
- Language:
- English
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