Rhenium ohmic contacts on 6H-SiC
- Department of Materials Science and Engineering, University of Florida, Gainesville, Florida 32611-6400 (United States)
Rhenium (Re) thin-film contacts (100-nm thick) were deposited on carbon-rich, nominally stoichiometric, and silicon-rich 6H-SiC surfaces, which were moderately doped with nitrogen (1.28x10{sup 18} cm{sup -3}). Morphology (Dektak), phase formation (x-ray diffraction), chemistry (Auger electron spectroscopy), and electrical properties (I-V) were characterized for the as-deposited and annealed (120 min, 1000 deg. C, vacuum <1x10{sup -6} Torr) contacts. As-deposited films were nonohmic. Films grown on carbon-rich surfaces were nonspecular, granular, and often delaminated during characterization. At room temperature in air, the Re films on stoichiometric SiC remained optically specular reflecting for 3 h, but then became hazy from oxidation. The Re films on silicon-rich surfaces, stored in air at room temperature, resisted ex situ oxidation for approximately 24 h. The annealed samples remained specular without visible signs of oxidation. The annealing resulted in a reduction in surface roughness for all the films regardless of substrate chemistry. The phase separation between carbon and rhenium was observed based on the formation of interfacial Re clusters and a {approx}10-nm graphite surface layer after annealing. Auger data showed that Si layers (5-10 nm) deposited to create Si-rich surfaces were partially consumed to form rhenium silicide during annealing, and the sharp Re/Si/SiC interface became more diffused with Re detected {approx}50 nm deeper into the structure. The annealing of Re films on moderately doped (1.28x10{sup 18} cm{sup -3}) SiC resulted in ohmic contacts with an average specific contact resistance of 7.0x10{sup -5} {omega} cm{sup 2} for stoichiometric and 1.6x10{sup -5} {omega} cm{sup 2} for silicon-rich samples. The annealed contacts on carbon-rich surfaces remained rectifying.
- OSTI ID:
- 20662160
- Journal Information:
- Journal of Applied Physics, Vol. 96, Issue 9; Other Information: DOI: 10.1063/1.1797550; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ANNEALING
AUGER ELECTRON SPECTROSCOPY
DEPOSITION
DOPED MATERIALS
ELECTRICAL PROPERTIES
ELECTRON BEAMS
GRAPHITE
INTERFACES
MORPHOLOGY
NITROGEN
OXIDATION
RHENIUM
ROUGHNESS
SEMICONDUCTOR MATERIALS
SILICON CARBIDES
STOICHIOMETRY
SUBSTRATES
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
X-RAY DIFFRACTION