Nearly strain-free heteroepitaxial system for fundamental studies of pulsed laser deposition: EuTiO{sub 3} on SrTiO{sub 3}

Journal Article · Mon Nov 01 00:00:00 EST 2004 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.1794362· OSTI ID:20662159

Wang, H -H; Fleet, Aaron; Brock, J D; Dale, Darren; Suzuki, Yuri ^[1]

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1. School of Applied and Engineering Physics and Cornell Center for Materials Research, Cornell University, Ithaca, New York 14853 (United States)

High-quality epitaxial thin films of EuTiO{sub 3} have been grown on the (001) surface of SrTiO{sub 3} using pulsed laser deposition. In situ x-ray reflectivity measurements reveal that the growth is two dimensional and enable real-time monitoring of the film thickness and roughness during growth. The film thickness, surface mosaic, surface roughness, and strain were characterized in detail by using ex situ x-ray diffraction. The thickness and composition were confirmed with Rutherford backscattering spectroscopy. The EuTiO{sub 3} thin films grow two dimensionally, epitaxially, and pseudomorphically, with no measurable in-plane lattice mismatch.

• OSTI ID: 20662159
• Journal Information: Journal of Applied Physics, Vol. 96, Issue 9; Other Information: DOI: 10.1063/1.1794362; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CRYSTAL GROWTH
ENERGY BEAM DEPOSITION
EPITAXY
EUROPIUM COMPOUNDS
LASER RADIATION
LAYERS
PULSED IRRADIATION
REFLECTION
REFLECTIVITY
ROUGHNESS
RUTHERFORD BACKSCATTERING SPECTROSCOPY
STRAINS
STRESSES
STRONTIUM TITANATES
SURFACES
THICKNESS
THIN FILMS
TWO-DIMENSIONAL CALCULATIONS
X-RAY DIFFRACTION