Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Investigation of single electron traps induced by InAs quantum dots embedded in GaAs layer using the low-frequency noise technique

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.1801163· OSTI ID:20658041
; ; ; ;  [1]
  1. Department of Physics, University of Thessaloniki, 54124 Thessaloniki (Greece)

The properties of the traps induced by InAs quantum dots (QDs), embedded in a GaAs layer grown by molecular beam epitaxy, are investigated by the low-frequency noise measurements using the Au/n-GaAs Schottky diode as a test device. The forward current noise spectra are composed of two noise components: a 1/f-like noise at low frequencies and a generation-recombination (g-r) noise at higher frequencies. The 1/f noise is ascribed to the mobility fluctuations within the space-charge region. The obtained Hooge parameter ({alpha}{sub H}=6x10{sup -5}) is larger than the expected value considering the phonon or impurity scattering mechanism, indicating the presence of the defects associated with QDs. The analysis of the g-r noise gives a single trap of density of about 1.6x10{sup 14} cm{sup -3} in the part of the GaAs layer located above the QDs.

OSTI ID:
20658041
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 10 Vol. 96; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English

Similar Records

Effect of rapid thermal annealing on the noise properties of InAs/GaAs quantum dot structures
Journal Article · Sat Sep 01 00:00:00 EDT 2007 · Journal of Applied Physics · OSTI ID:21057538

Low-frequency noise properties in Pt-indium gallium zinc oxide Schottky diodes
Journal Article · Mon Aug 31 00:00:00 EDT 2015 · Applied Physics Letters · OSTI ID:22489210

Neutron-irradiated Schottky diodes with self-assembled InAs quantum dots: Optical and electrical properties
Journal Article · Fri May 15 00:00:00 EDT 2009 · Journal of Applied Physics · OSTI ID:21352209