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Title: High-resolution X-ray Microdiffraction System for Characterization of Selectively Grown Layers using a Zone Plate Combined with a Narrow Slit

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.1758033· OSTI ID:20652860
 [1]; ; ; ; ; ;  [2];  [3]
  1. Japan Synchrotron Radiation Research Institute (JASRI), 1-1-1 Kouto, Mikazuki, Sayo, Hyogo 679-5198 (Japan)
  2. Graduate School of Science, Himeji Institute of Technology, 3-2-1 Kouto, Kamigori, Ako, Hyogo 678-1297 (Japan)
  3. Fundamental Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501 (Japan)

We have developed a high-resolution x-ray microdiffraction system at the BL24XU of the SPring-8. This system uses a focused beam produced by using a zone plate combined with a narrow slit. The size of the focused beam is 0.32 {mu}m vertically and 1.3 {mu}m horizontally and the angular divergence in the horizontal direction is about 70 {mu}rad at a photon energy of 15 keV. This low-divergence microbeam enables us to perform high-resolution x-ray microdiffraction experiments using a precise {theta}-2{theta} goniometer with sub-100-nm-resolved XYZ sample positioning stages. We demonstrate that the spatial non-uniformity of the strain and the period in InGaAsP multi-quantum-well structures, fabricated by selective metalorganic-vapor-phase epitaxy, can be measured with sufficient accuracy using this system.

OSTI ID:
20652860
Journal Information:
AIP Conference Proceedings, Vol. 705, Issue 1; Conference: 8. international conference on synchrotron radiation instrumentation, San Francisco, CA (United States), 25-29 Aug 2003; Other Information: DOI: 10.1063/1.1758033; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English