Effects in synergistic blistering of silicon by coimplantation of H, D, and He ions
- INRS-EMT, Universite du Quebec, 1650 Boul. Lionel-Boulet, Varennes, Quebec J3X 1S2 (Canada)
Silicon blistering was achieved at unprecedently low ion fluences of 2x10{sup 15} He/cm{sup 2} (8 keV) followed by 6x10{sup 15} H/cm{sup 2} (5 keV), but no blistering occurs for reversed order (H+He), or (He+D) coimplantation up to a high fluence. Raman scattering data suggest that: (i) the He synergy is due to He assistance in the appearance of H-passivated internal surfaces and their pressurization at high temperature; (ii) the order effect is due to the destruction by the room-temperature He postbombardment of favorable Si-H structures; and (iii) the isotope effect is due to the deuterated multivacancies evolving into surprisingly stable interstitial and bond-centered configurations.
- OSTI ID:
- 20636996
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 5 Vol. 86; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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