Amorphous silicon nitride films of different composition deposited at room temperature by pulsed glow discharge plasma immersion ion implantation and deposition
Journal Article
·
· Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
- Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)
Amorphous hydrogenated silicon nitride (a-SiN{sub x}:H) films of different compositions (0{<=}x{<=}1.18) were prepared by pulsed glow discharge plasma immersion ion implantation and deposition. The processing gases were silane and nitrogen at a substrate temperature {<=}50 deg. C. The properties of the films were investigated using Rutherford backscattering, elastic recoil detection analysis, UV-visible optical absorption, Fourier transform infrared, and Raman spectroscopies, and nanoindentation. Depending on the value of x, the band gap of the films changes from 1.54 to 4.42 eV, and hardness changes from 11.2 to 15.3 GPa. Changes in the film properties are caused by formation of Si-N bonds and by reducing disorder in the films. It is shown that hard and transparent silicon nitride films can be obtained at room temperature.
- OSTI ID:
- 20636776
- Journal Information:
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films Journal Issue: 6 Vol. 22; ISSN 0734-2101; ISSN JVTAD6
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
AMORPHOUS STATE
CHEMICAL BONDS
ENERGY GAP
EV RANGE 01-10
FOURIER TRANSFORM SPECTROMETERS
GLOW DISCHARGES
HARDNESS
ION IMPLANTATION
NITROGEN
PLASMA
PRESSURE RANGE GIGA PA
RAMAN SPECTROSCOPY
RECOILS
RUTHERFORD BACKSCATTERING SPECTROSCOPY
SILICON NITRIDES
SURFACE COATING
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
ULTRAVIOLET SPECTRA
SUPERCONDUCTIVITY AND SUPERFLUIDITY
AMORPHOUS STATE
CHEMICAL BONDS
ENERGY GAP
EV RANGE 01-10
FOURIER TRANSFORM SPECTROMETERS
GLOW DISCHARGES
HARDNESS
ION IMPLANTATION
NITROGEN
PLASMA
PRESSURE RANGE GIGA PA
RAMAN SPECTROSCOPY
RECOILS
RUTHERFORD BACKSCATTERING SPECTROSCOPY
SILICON NITRIDES
SURFACE COATING
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
ULTRAVIOLET SPECTRA