Evolution of local texture and grain morphology in metal plasma immersion ion implantation and deposition of TiN

Journal Article · Mon Nov 01 04:00:00 EST 2004 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

DOI:https://doi.org/10.1116/1.1795828· OSTI ID:20636771

Manova, D; Attenberger, W; Maendl, S; Stritzker, B; Rauschenbach, B ^[1]

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1. Leibniz-Institut fuer Oberflaechenmodifizierung Leipzig, (Germany)

The local crystallographic texture and grain orientation was investigated for deposition of TiN by metal plasma immersion ion implantation and deposition (MePIIID) at different ion incident angles across one sample. A very good match between the tilt of (fiber) texture and the tilt of grains was observed, indicating the validity of models for ion beam assisted deposition (IBAD) also for MePIIID. A (100) orientation was obtained for 5 kV pulses at 9% duty cycle. The ion incident angle changed from near normal at the center towards 35 deg. tilt away from the surface normal at the sample edge for the substrate orientation at 45 deg. towards the cathode. However, due to the pulsed regime in MePIIID, there exist certain differences from IBAD.

• OSTI ID: 20636771
• Journal Information: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films Journal Issue: 6 Vol. 22; ISSN 0734-2101; ISSN JVTAD6
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CRYSTALLOGRAPHY
DEPOSITION
GRAIN ORIENTATION
INCIDENCE ANGLE
ION BEAMS
ION IMPLANTATION
MORPHOLOGY
PLASMA
SURFACE PROPERTIES
TEXTURE
TITANIUM NITRIDES