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Title: Tailoring the Ti/4H-SiC Schottky barrier by ion irradiation

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.1841476· OSTI ID:20634566
; ; ;  [1]
  1. CNR-IMM, Sezione di Catania, Stradale Primosole 50, I-95121 Catania (Italy)

The effects of ion irradiation on the Ti/4H-SiC Schottky barrier are discussed. The Ti/SiC interfacial region was modified by irradiating Schottky diodes with 8 MeV Si{sup +4} ions at fluences between 1x10{sup 9} and 1x10{sup 12} ions/cm{sup 2}. By increasing the ion fluence, an increase of the Schottky barrier {phi}{sub B} occurs, from the value of 1.05 eV after preparation to the value of 1.21 eV after irradiation at a fluence of 1x10{sup 12} ions/cm{sup 2}, without substantial changes in the ideality factor (n=1.09). Along with the barrier height increase, a decrease of the leakage current of about two orders of magnitude was observed after irradiation. The results were interpreted in terms of the structural and electrical modification of the interfacial region.

OSTI ID:
20634566
Journal Information:
Applied Physics Letters, Vol. 85, Issue 25; Other Information: DOI: 10.1063/1.1841476; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English