Ion Beam Processing and Analysis of MgO Thin Films

Journal Article · Tue Aug 26 04:00:00 EDT 2003 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.1619791· OSTI ID:20632640

Nomura, Hiroshi; Yasui, Nobuto ^[1]; Ide-Ektessabi, Ari ^[2]; Tsukuda, Yuji ^[3]

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1. Graduate School of Engineering, Kyoto University, Yoshidahonmachi, Sakyo-ku, Kyoto, 606-8501 (Japan)
2. International Innovation Center, Kyoto University, Yoshidahonmachi, Sakyo-ku, Kyoto, 606-8501 (Japan)
3. Sanwa Kenma Ltd., 22-1, Kaminoyama, Okubo-cho, Uji City, Kyoto, 611-0033 (Japan)

Thin film of MgO is widely used as a protecting layer of plasma display panel (PDP). We prepared the MgO thin films using ion beam assisted deposition (IBAD) technique with the aim of controlling the crystal orientation of the films. Oxygen ion beam was utilized to irradiate the growing films. The ion beam irradiation was performed by electron cyclotron resonance (ECR) type ion source. The flux of evaporated MgO was produced using an electron gun. Energy and current density of the ion beam as well as deposition rate were taken as the parameters to control the deposition. Composition and crystallinity of the films were measured using Rutherford backscattering spectroscopy (RBS) and X-ray diffraction (XRD). In this study, we discuss the effects of simultaneous irradiation of the films by oxygen ion beam during film growth. Experimental results suggest that the ion beam irradiation during film growth strongly influences the crystal properties of the films to have the best orientation for high efficiency secondary electron emission.

• OSTI ID: 20632640
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 680; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CRYSTAL STRUCTURE
CURRENT DENSITY
ELECTRON CYCLOTRON-RESONANCE
ELECTRON EMISSION
ELECTRON GUNS
ENERGY BEAM DEPOSITION
ION BEAMS
ION SOURCES
MAGNESIUM OXIDES
PLASMA
RUTHERFORD BACKSCATTERING SPECTROSCOPY
THIN FILMS
X-RAY DIFFRACTION