Sputter deposition and characterization of carbon nitride thin films
Book
·
OSTI ID:203509
- Lockheed Research and Development Division, Palo Alto, CA (United States)
Carbon nitride (CN{sub x}) films have been synthesized using DC magnetron sputtering of graphite target in nitrogen environments. X-ray photoelectron spectroscopy (XPS or ESCA) characterization of films showed presence of C and N in a variety of binding states, including those consistent with a tetrahedral {beta}-C{sub 3}N{sub 4} phase. Semiquantitative measurements of these binding states are employed as a guide to optimize the deposition parameters including gas composition, temperature, power and RF bias. The role of O{sub 2} and H{sub 2} additions to the N{sub 2} plasma gas on the C-C and C-N binding states were explored in order to maximize the C{sub 3}N{sub 4} phase content of the films.
- OSTI ID:
- 203509
- Report Number(s):
- CONF-950201--; ISBN 0-87339-317-1
- Country of Publication:
- United States
- Language:
- English
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