High-resolution submicron retarding field energy analyzer for low-temperature plasma analysis

Journal Article · Mon Dec 20 00:00:00 EST 1999 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.125495· OSTI ID:20217754

Blain, M G ^[1]; Stevens, J E ^[1]; Woodworth, J R ^[1]

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1. Sandia National Laboratories, Albuquerque, New Mexico 87185-1077 (United States)

A retarding potential energy analyzer having 750 nm diameter, self-aligned grid apertures and micron scale grid separation has been fabricated using polycrystalline silicon and silicon dioxide. High-resolution in situ measurements of ion velocity distributions have been demonstrated in inductively coupled argon plasmas. Measurement results agree well with those from a macroscopic analyzer. Important differences are observed in the energies of plasma ions when measured with respect to chamber wall versus those measured with respect to the plasma floating potential. Preliminary measurements under rf bias conditions have also been made and results follow the expected trends. (c) 1999 American Institute of Physics.

• OSTI ID: 20217754
• Journal Information: Applied Physics Letters, Vol. 75, Issue 25; Other Information: PBD: 20 Dec 1999; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
PLASMA DIAGNOSTICS
MEASURING METHODS
SILICON
SILICON OXIDES
ENERGY ANALYSIS
ION DETECTION
ELECTRIC DISCHARGES
SPACE CHARGE
EXPERIMENTAL DATA