Bonding and hardness in nonhydrogenated carbon films with moderate sp{sup 3} content

Journal Article · Thu Jun 01 04:00:00 EDT 2000 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.373514· OSTI ID:20216373

Gago, R ^[1]; Jimenez, I ^[1]; Albella, J M ^[1]; Climent-Font, A ^[2]; Caceres, D ^[3]; Vergara, I ^[3]; Banks, J C ^[4]; Doyle, B L ^[4]; Terminello, L J ^[5]

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1. Instituto de Ciencia de Materiales de Madrid (CSIC), 28049 Madrid, (Spain)
2. Departmento de Fisica Aplicada (C-XII), Universidad Autonoma de Madrid. 28049 Madrid, (Spain)
3. Departmento de Fisica Aplicada, Universidad Carlos III de Madrid, 28911 Leganes, (Spain)
4. Sandia National Laboratories, Radiation Solid Interactions and Processing. Albuquerque, New Mexico 87185-1056 (United States)
5. Lawrence Livermore National Laboratory, Livermore, California 94550 (United States)

Amorphous carbon films with an sp{sup 3} content up to 25% and a negligible amount of hydrogen have been grown by evaporation of graphite with concurrent Ar{sup +} ion bombardment. The sp{sup 3} content is maximized for Ar{sup +} energies between 200 and 300 eV following a subplantation mechanism. Higher ion energies deteriorate the film due to sputtering and heating processes. The hardness of the films increases in the optimal assisting range from 8 to 18 GPa, and is explained by crosslinking of graphitic planes through sp{sup 3} connecting sites. (c) 2000 American Institute of Physics.

• OSTI ID: 20216373
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 87; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
AMORPHOUS STATE
BOND ANGLE
CARBON
ELASTICITY
EXPERIMENTAL DATA
HARDNESS
HYDROGEN ADDITIONS
THIN FILMS
VAPOR DEPOSITED COATINGS