Structural changes in a-Si:H film crystallinity with high H dilution
Journal Article
·
· Physical Review. B, Condensed Matter and Materials Physics
- National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)
- United Solar Systems Corp., Troy, Michigan 48084 (United States)
- Colorado School of Mines, Golden, Colorado 80401 (United States)
Using infrared absorption (ir) spectroscopy, H evolution, and x-ray diffraction (XRD), the structure of high-H-dilution, plasma-enhanced chemical vapor deposition a-Si:H films ''on the edge of crystallinity'' is examined. From the ir Si-H wag mode peak frequency and the XRD results, we postulate the existence of very small Si crystallites contained within the as-grown amorphous matrix with the majority of the bonded H located on these crystallite surfaces. Upon annealing, a low-temperature H-evolution peak appears, and film crystallization is observed at temperatures as low as 500 degree sign C, which is far below that observed for a-Si:H films grown without H dilution. While the crystallite sizes and volume fraction are too small to be detected by XRD in the as-grown films, these crystallites catalyze the crystallization of the remainder of the amorphous matrix upon annealing, enabling the evolution of H at low temperatures. The large spatial inhomogeneity in the H bonding thus produced throughout the film is suggested to be one of the reasons for the reduced Staebler-Wronski effect observed in solar cells utilizing these films. (c) 2000 The American Physical Society.
- OSTI ID:
- 20215212
- Journal Information:
- Physical Review. B, Condensed Matter and Materials Physics, Journal Name: Physical Review. B, Condensed Matter and Materials Physics Journal Issue: 3 Vol. 61; ISSN 1098-0121
- Country of Publication:
- United States
- Language:
- English
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