Two-dimensional fluid model for an inductively coupled chemical vapor deposition reactor

Conference · Thu Jul 01 04:00:00 EDT 1999

OSTI ID:20034288

Bera, K; Farouk, B

A self-consistent two-dimensional radio-frequency inductively coupled glow discharge model has been developed in cylindrical coordinates using a fluid model. The objective of the study is to provide insights to charged species dynamics and investigate their effects on plasma process for a non-reacting Ar and depositing methane discharges. The model includes continuity, momentum and energy equations for electron and ions. An electromagnetic model that considers electric field due to space charge within the plasma and due to inductive power coupling, is also incorporated. For methane discharge the authors expect to find higher flux to the cathode, and hence higher deposition rate. The independent control of ion energy to the cathode in an inductive discharge will facilitate a control of quality of the deposited film. Swarm data as a function of electron energy are provided as input to the model. The model predicts electron density, ion density, and their fluxes and energies to the cathode. The role of electrons, and dominating ions in high density discharge will be investigated. The neutral and radical densities in the discharge are calculated using a global model. The advantages of capacitively coupled discharges are simplicity of design, initial cost and ease of operations. The numerical model for inductively coupled rf discharge considers a reactor with planar configuration with four coils at the top of the reactor separated by a dielectric window. The fluid model equations are solved in the interior of the discharge chamber. The electromagnetic model equations are solved over a domain that includes the discharge chamber, quartz insulator, and a vacuum region that includes the coils. The authors have carried out parametric studies to study the effects of operating conditions of the reactor on deposition characteristics.

• Research Organization: Drexel Univ., Philadelphia, PA (US)
• OSTI ID: 20034288
• Country of Publication: United States
• Language: English

Related Subjects

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
36 MATERIALS SCIENCE
ARGON
CHEMICAL REACTORS
CHEMICAL VAPOR DEPOSITION
GLOW DISCHARGES
METHANE
PARAMETRIC ANALYSIS
PERFORMANCE
PLASMA SIMULATION
TWO-DIMENSIONAL CALCULATIONS