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Title: Method for correcting imperfections on a surface

Abstract

A process for producing near perfect optical surfaces is disclosed. A previously polished optical surface is measured to determine its deviations from the desired perfect surface. A multi-aperture mask is designed based on this measurement and fabricated such that deposition through the mask will correct the deviations in the surface to an acceptable level. Various mask geometries can be used: variable individual aperture sizes using a fixed grid for the apertures or fixed aperture sizes using a variable aperture spacing. The imperfections are filled in using a vacuum deposition process with a very thin thickness of material such as silicon monoxide to produce an amorphous surface that bonds well to a glass substrate.

Authors:
;
Publication Date:
Sponsoring Org.:
US Department of Energy
OSTI Identifier:
20013813
Alternate Identifier(s):
OSTI ID: 20013813
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 7 Sep 1999
Country of Publication:
United States
Language:
English
Subject:
32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION; 36 MATERIALS SCIENCE; MANUFACTURING; OPTICAL SYSTEMS; SURFACE FINISHING; MASKING; CORRECTIONS; FILLERS; GLASS; SILICON OXIDES

Citation Formats

Sweatt, W.C., and Weed, J.W. Method for correcting imperfections on a surface. United States: N. p., 1999. Web.
Sweatt, W.C., & Weed, J.W. Method for correcting imperfections on a surface. United States.
Sweatt, W.C., and Weed, J.W. Tue . "Method for correcting imperfections on a surface". United States.
@article{osti_20013813,
title = {Method for correcting imperfections on a surface},
author = {Sweatt, W.C. and Weed, J.W.},
abstractNote = {A process for producing near perfect optical surfaces is disclosed. A previously polished optical surface is measured to determine its deviations from the desired perfect surface. A multi-aperture mask is designed based on this measurement and fabricated such that deposition through the mask will correct the deviations in the surface to an acceptable level. Various mask geometries can be used: variable individual aperture sizes using a fixed grid for the apertures or fixed aperture sizes using a variable aperture spacing. The imperfections are filled in using a vacuum deposition process with a very thin thickness of material such as silicon monoxide to produce an amorphous surface that bonds well to a glass substrate.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {9}
}