Deterministic nanoscale quantum spin-defect implantation and diffraction strain imaging

Delegan, Nazar; Whiteley, Samuel J.; Zhou, Tao; Bayliss, Sam L.; Titze, Michael; Bielejec, Edward; Holt, Martin V.; Awschalom, David D.; Heremans, F. Joseph

doi:10.1088/1361-6528/acdd09

Deterministic nanoscale quantum spin-defect implantation and diffraction strain imaging

Journal Article · Mon Jul 03 00:00:00 EDT 2023 · Nanotechnology

DOI:https://doi.org/10.1088/1361-6528/acdd09· OSTI ID:1987983

; Whiteley, Samuel J.; Zhou, Tao; ; Titze, Michael; Bielejec, Edward; Holt, Martin V.; Awschalom, David D.; Heremans, F. Joseph

Abstract

Local crystallographic features negatively affect quantum spin defects by changing the local electrostatic environment, often resulting in degraded or varied qubit optical and coherence properties. Few tools exist that enable the deterministic synthesis and study of such intricate systems on the nano-scale, making defect-to-defect strain environment quantification difficult. In this paper, we highlight state-of-the-art capabilities from the U.S. Department of Energy’s Nanoscale Science Research Centers that directly address these shortcomings. Specifically, we demonstrate how complementary capabilities of nano-implantation and nano-diffraction can be used to demonstrate the quantum relevant, spatially deterministic creation of neutral divacancy centers in 4H silicon carbide, while investigating and characterizing these systems on the $\leq 25 nm$ scale with strain sensitivities on the order of $1 \times 10^{- 6},$ relevant to defect formation dynamics. This work lays the foundation for ongoing studies into the dynamics and deterministic formation of low strain homogeneous quantum relevant spin defects in the solid state.

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Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE National Nuclear Security Administration (NNSA)

Grant/Contract Number:: AC02-06CH11357; NA0003525

OSTI ID:: 1987983

Alternate ID(s):: OSTI ID: 2311751
OSTI ID: 2396281
OSTI ID: 1984558

Journal Information:: Nanotechnology, Journal Name: Nanotechnology Journal Issue: 38 Vol. 34; ISSN 0957-4484

Publisher:: IOP PublishingCopyright Statement

Country of Publication:: United Kingdom

Language:: English

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