Proton radiation effects on electronic defect states in MOCVD-grown (010) β-Ga2O3
- The Ohio State Univ., Columbus, OH (United States)
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
The impact of 1.8 MeV proton irradiation on metalorganic chemical vapor deposition grown (010) β-Ga2O3 Schottky diodes is presented. It is found that after a 10.8 × 1013 cm–2 proton fluence the Schottky barrier height of (1.40 ± 0.05 eV) and the ideality factor of (1.05 ± 0.05 ) are unaffected. Capacitance–voltage extracted net ionized doping curves indicate a carrier removal rate of 268 ± 10 cm–1. The defect states responsible for the observed carrier removal are studied through a combination of deep level transient and optical spectroscopies (DLTS/DLOS) as well as lighted capacitance–voltage (LCV) measurements. The dominating effect on the defect spectrum is due to the Ec-2.0 eV defect state observed in DLOS and LCV. This state accounts for ~75 % of the total trap introduction rate and is the primary source of carrier removal from proton irradiation. Of the DLTS detected states, the Ec-0.72 eV state dominated but had a comparably smaller contribution to the trap introduction. These two traps have previously been correlated with acceptor-like gallium vacancy-related defects. Several other trap states at EC-0.36, EC-0.63, and EC-1.09 eV were newly detected after proton irradiation, and two pre-existing states at EC-1.2 and EC-4.4 eV showed a slight increase in concentration after irradiation, together accounting for the remainder of trap introduction. However, a pre-existing trap at Ec-0.40 eV was found to be insensitive to proton irradiation and, therefore, is likely of extrinsic origin. Furthermore, the comprehensive defect characterization of 1.8 MeV proton irradiation damage can aid the modeling and design for a range of radiation tolerant devices.
- Research Organization:
- Georgia Institute of Technology, Atlanta, GA (United States); Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE National Nuclear Security Administration (NNSA); Department of the Defense, Defense Threat Reduction Agency; US Air Force Office of Scientific Research (AFOSR)
- Grant/Contract Number:
- NA0003921; HDTRA11710034; DGE-1343012; FA9550-22-1-0012; NA0003525; Award Number DE-NA0003921
- OSTI ID:
- 1971636
- Alternate ID(s):
- OSTI ID: 1916513; OSTI ID: 2311671
- Report Number(s):
- SAND-2023-00299J; TRN: US2313584
- Journal Information:
- Journal of Applied Physics, Vol. 133, Issue 4; ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
Electrical properties and parameters
Schottky diodes
Current-voltage characteristic
Semiconductor device defects
Deep level transient spectroscopy
Optical spectroscopy
Radiation damage
Schottky barriers
Chemical vapor deposition
Oxides
electrical properties and parameters
current-voltage characteristic
semiconductor device defects
deep level transient spectroscopy
optical spectroscopy
radiation damage
chemical vapor deposition
oxides