skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Understanding the origin of Tabula Rasa-induced defects in n-type Cz c-Si: The case of nitrogen atmosphere

Journal Article · · Solar Energy Materials and Solar Cells

Phosphorus-doped Czochralski-grown silicon (Cz-Si) has been gaining market share in the large-scale manufacturing of high-efficiency silicon (Si)-based photovoltaic (PV) devices thanks to higher carrier lifetimes than their boron-doped counterpart. However, the fabrication of n-type Cz-Si based solar cells often requires process steps with much higher temperatures and longer times than p-type Silicon. Defect interaction with the high temperatures during such processes tend to be detrimental to the n-type Cz-Si carrier lifetime, therefore limiting the final device efficiency. Short thermal anneals before cell processing, known as Tabula Rasa (TR), have been proposed to mitigate the thermally induced lifetime degradation during n-type Cz-Si solar cell fabrication. This work thoroughly investigates the defects responsible for the lifetime degradation after TR in a N2 atmosphere treatment. We use temperature-injection-dependent lifetime spectroscopy and the thickness variation method to decouple the effects of TR treatment in the bulk and the surface of the n-type Cz-Si wafers. Using the defect parameter contour mapping (DPCM), we identify the defect energy level (Et) and the capture cross-section ratio (k) of the most likely process-induced defect, which aligns with previously proposed Si vacancy-associated defects. The DPCM reveals that these vacancy-associated defects have a shallow energy level Et - Ev ~0.13 eV and very efficient electron capture cross section k~600. Unexpectedly, the bulk degradation due to vacancy defects in the volume of the wafer, is accompanied by a significant increase in the surface recombination as well. Through evaluating the surface recombination velocity temperature- and injection dependence, we show that after TR, at room temperature and for an injection level of 1015 cm-3, in a wafer passivated with a-Si:H(i) the surface recombination dominates the overall lifetime response. Here we hypothesize that the near surface vacancy-associated bulk defects play a role in lowering the electron diffusion current into the a-Si:H(i) from the c-Si(n) reducing the field-effect passivation.

Research Organization:
National Renewable Energy Laboratory (NREL), Golden, CO (United States)
Sponsoring Organization:
USDOE Office of Energy Efficiency and Renewable Energy (EERE), Renewable Power Office. Solar Energy Technologies Office
Grant/Contract Number:
AC36-08GO28308
OSTI ID:
1923878
Report Number(s):
NREL/JA-5900-84095; MainId:84868; UUID:aa32f519-429d-4527-bf5c-979b522de758; MainAdminID:68657
Journal Information:
Solar Energy Materials and Solar Cells, Vol. 252; ISSN 0927-0248
Publisher:
ElsevierCopyright Statement
Country of Publication:
United States
Language:
English

References (40)

Relaxation of vacancy depth profiles in silicon wafers: A low apparent diffusivity of vacancy species journal January 2014
Improved Parameterization of Auger Recombination in Silicon journal January 2012
Removing the effect of striations in n-type silicon solar cells journal November 2014
Rapid Thermal Processing and the Control of Oxygen Precipitation Behaviour in Silicon Wafers journal March 2008
Recombination activity of interstitial iron and other transition metal point defects in p- and n-type crystalline silicon journal November 2004
Negative-U properties of the lattice vacancy in silicon journal February 1983
Interlaboratory Study of Eddy-Current Measurement of Excess-Carrier Recombination Lifetime journal January 2014
Negative-U Properties for Point Defects in Silicon journal March 1980
Reassessment of the intrinsic bulk recombination in crystalline silicon journal January 2022
Statistics of the Recombinations of Holes and Electrons journal September 1952
Limitations on dynamic excess carrier lifetime calibration methods journal May 2011
Unraveling bulk defects in high-quality c-Si material via TIDLS: Unraveling bulk defects in high-quality c-Si material
  • Bernardini, Simone; Naerland, Tine U.; Blum, Adrienne L.
  • Progress in Photovoltaics: Research and Applications, Vol. 25, Issue 3 https://doi.org/10.1002/pip.2847
journal December 2016
Methods to Improve Bulk Lifetime in n-Type Czochralski-Grown Upgraded Metallurgical-Grade Silicon Wafers journal July 2018
Is It Possible to Unambiguously Assess the Presence of Two Defects By Temperature- and Injection-Dependent Lifetime Spectroscopy? journal March 2018
Amorphous/Crystalline Silicon Interface Passivation: Ambient-Temperature Dependence and Implications for Solar Cell Performance journal May 2015
A recombination model for a-Si:H/c-Si heterostructures journal January 2010
Temperature dependence of the radiative recombination coefficient in crystalline silicon from spectral photoluminescence journal March 2014
Toward the Practical Limits of Silicon Solar Cells journal November 2014
High quality crystalline silicon surface passivation by combined intrinsic and n-type hydrogenated amorphous silicon journal November 2011
Effect of rapid thermal annealing on recombination centres in boron-doped Czochralski-grown silicon journal January 2014
Review of injection dependent charge carrier lifetime spectroscopy journal January 2021
Properties of interfaces in amorphous/crystalline silicon heterojunctions journal March 2010
On the mechanism of recombination at oxide precipitates in silicon journal January 2013
A Contactless Method for Determining the Carrier Mobility Sum in Silicon Wafers journal January 2012
Tabula Rasa for n ‐Cz silicon‐based photovoltaics
  • LaSalvia, Vincenzo; Youssef, Amanda; Jensen, Mallory A.
  • Progress in Photovoltaics: Research and Applications, Vol. 27, Issue 2 https://doi.org/10.1002/pip.3068
journal August 2018
Very fast light-induced degradation of a -Si:H/ c -Si(100) interfaces journal June 2011
Accurate method for the determination of bulk minority-carrier lifetimes of mono- and multicrystalline silicon wafers journal May 1997
The Engineering of Silicon Wafer Material Properties Through Vacancy Concentration Profile Control and the Achievement of Ideal Oxygen Precipitation Behavior journal January 1998
Fermi level pinning on HF etched silicon surfaces investigated by photoelectron spectroscopy
  • Schlaf, R.; Hinogami, R.; Fujitani, M.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 17, Issue 1 https://doi.org/10.1116/1.581568
journal January 1999
Influence of Tabula Rasa on Process- and Light-Induced Degradation of Solar Cells Fabricated From Czochralski Silicon journal November 2020
Temperature- and injection-dependent lifetime spectroscopy for the characterization of defect centers in semiconductors journal March 2003
Observation of Vacancy Enhancement during Rapid Thermal Annealing in Nitrogen journal July 1997
Multiple structural forms of a vacancy in silicon as evidenced by vacancy profiles produced by rapid thermal annealing journal September 2014
Effect of High Temperature Pre-Anneal on Oxygen Precipitates Nucleation Kinetics in Si journal July 1997
Abruptness of a-Si:H∕c-Si interface revealed by carrier lifetime measurements journal January 2007
On the classification of traps and recombination centres journal November 1973
Lifetime spectroscopy for defect characterization: Systematic analysis of the possibilities and restrictions journal February 2002
Review of light-induced degradation in crystalline silicon solar cells journal April 2016
Thermal activation energy for the passivation of the n-type crystalline silicon surface by hydrogenated amorphous silicon journal April 2009
Accounting for the Dependence of Coil Sensitivity on Sample Thickness and Lift-Off in Inductively Coupled Photoconductance Measurements journal November 2019