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Topological spin memory of antiferromagnetically coupled skyrmion pairs in Co/Gd/Pt multilayers

Journal Article · · Physical Review Materials
 [1];  [2];  [2];  [2];  [1];  [3];  [4];  [5];  [6];  [7];  [7];  [5];  [5];  [5];  [8];  [2];  [1]
  1. Bryn Mawr College, PA (United States)
  2. Colorado State University, Fort Collins, CO (United States)
  3. Bryn Mawr College, PA (United States); Colorado State University, Fort Collins, CO (United States)
  4. Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)
  5. Argonne National Laboratory (ANL), Argonne, IL (United States)
  6. Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS); University of California, Los Angeles, CA (United States)
  7. Argonne National Laboratory (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
  8. Argonne National Laboratory (ANL), Argonne, IL (United States); University of Illinois at Urbana-Champaign, IL (United States)
Antiferromagnetically (AFM) coupled skyrmions offer potential advantages for spintronic devices, including reduced dipolar fields that may enable smaller skyrmion sizes and a reduction of the skyrmion Hall effect. However, the topological stability of AFM-coupled skyrmions subjected to dramatic spin deformation through low-temperature cycling has not been investigated. We report the discovery of a topological spin memory effect for AFM-coupled skyrmion pairs in [Co/Gd/Pt](10) multilayered films. Photoemission electron microscopy imaging shows that bubble skyrmions in the multilayer that are stable at room temperature evolve into complex in-plane spin textures as the temperature is lowered and reform completely when the sample is warmed back up. Simulations demonstrate that Dzyaloshinskii-Moriya interactions play a key role in this spin memory effect, and furthermore reveal that the topological charge is preserved throughout the dramatic spin texture rearrangement and recovery. These results highlight a key aspect of topological protection-the preservation of the topological properties under continuous deformation-and also provide a promising avenue for information encryption and recovery.
Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States); Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE)
Grant/Contract Number:
AC02-05CH11231; AC02-06CH11357
OSTI ID:
1909622
Journal Information:
Physical Review Materials, Journal Name: Physical Review Materials Journal Issue: 8 Vol. 6; ISSN 2475-9953
Publisher:
American Physical Society (APS)Copyright Statement
Country of Publication:
United States
Language:
English

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