Sequential Brush Grafting for Chemically and Dimensionally Tolerant Directed Self-Assembly of Block Copolymers

Chang, Boyce S.; Loo, Whitney S.; Yu, Beihang; Dhuey, Scott; Wan, Lei; Nealey, Paul F.; Ruiz, Ricardo

doi:10.1021/acsami.2c16508

Title: Sequential Brush Grafting for Chemically and Dimensionally Tolerant Directed Self-Assembly of Block Copolymers

Journal Article · Mon Dec 19 00:00:00 EST 2022 · ACS Applied Materials and Interfaces

DOI:https://doi.org/10.1021/acsami.2c16508· OSTI ID:1905654

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Molecular Foundry, Lawrence Berkeley National Lab, Berkeley, California 94720, United States
Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States
Western Digital, San Jose, California 95119, United States
Pritzker School of Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States, Materials Sciences Division, Argonne National Lab, Lemont, Illinois 60439, United States

We report a method for the directed self-assembly (DSA) of block copolymers (BCPs) in which a first BCP film deploys homopolymer brushes, or “inks”, that sequentially graft onto the substrate’s surface via the interpenetration of polymer molecules during the thermal annealing of the polymer film on top of existing polymer brushes. By selecting polymer “inks” with the desired chemistry and appropriate relative molecular weights, it is possible to use brush interpenetration as a powerful technique to generate self-registered chemical contrast patterns at the same frequency as that of the domains of the BCP. The result is a process with a higher tolerance to dimensional and chemical imperfections in the guiding patterns, which we showcase by implementing DSA using homopolymer brushes for the guiding features as opposed to more robust cross-linkable mats. We find that the use of “inks” does not compromise the line width roughness, and the quality of the DSA as a lithographic mask is verified by implementing a robust “dry lift-off” pattern transfer.

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Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). National Energy Research Scientific Computing Center (NERSC)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1905654

Alternate ID(s):: OSTI ID: 1909631

Journal Information:: ACS Applied Materials and Interfaces, Journal Name: ACS Applied Materials and Interfaces Vol. 15 Journal Issue: 1; ISSN 1944-8244

Publisher:: American Chemical SocietyCopyright Statement

Country of Publication:: United States

Language:: English

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37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
directed self-assembly
block copolymer
thin films
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defectivity

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