Cylindrical Magnetron Development for Nb3sn Deposition via Magnetron Sputtering

Conference · Wed Sep 01 04:00:00 EDT 2021

DOI:https://doi.org/10.18429/JACoW-SRF2021-THPTEV015· OSTI ID:1905306

Sayeed, Md. N. ^[1]; Elsayed-Ali, H. ^[1]; Côté, C. ^[2]; Farzad, M. A. ^[2]; Sarkissian, A. ^[2]; Eremeev, G. V. ^[3]; Valente-Feliciano, A-M. ^[4]

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1. Old Dominion Univ., Norfolk, VA (United States)
2. PLASMIONIQUE Inc., Varennes, Québec, Canada
3. Fermi National Accelerator Lab. (FNAL), Batavia, IL (United States). Fermilab Center for Particle Astrophysics
4. Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)

Due to its bet­ter su­per­con­duct­ing prop­er­ties (crit­i­cal tem­per­a­ture Tc~ 18.3 K, su­per­heat­ing field Hsh~ 400 mT), Nb₃Sn is con­sid­ered as a po­ten­tial al­ter­na­tive to nio­bium (Tc~ 9.25 K, Hsh~ 200 mT) for su­per­con­duct­ing ra­diofre­quency (SRF) cav­i­ties for par­ti­cle ac­cel­er­a­tion. Mag­netron sput­ter­ing is an ef­fec­tive method to pro­duce su­per­con­duct­ing Nb₃Sn films. We de­posited su­per­con­duct­ing Nb₃Sn films on sam­ples with mag­netron sput­ter­ing using co-sput­ter­ing, se­quen­tial sput­ter­ing, and sput­ter­ing from a sto­i­chio­met­ric tar­get. Nb₃Sn films pro­duced by mag­netron sput­ter­ing in our pre­vi­ous ex­per­i­ments have achieved DC su­per­con­duct­ing crit­i­cal tem­per­a­ture up to 17.93 K and RF su­per­con­duct­ing tran­si­tion at 17.2 K. A mag­netron sput­ter­ing sys­tem with two iden­ti­cal cylin­dri­cal cath­odes that can be used to sput­ter Nb₃Sn films on cav­i­ties has been de­signed and is under de­vel­op­ment now. We re­port on the de­sign and the cur­rent progress on the de­vel­op­ment of the sys­tem.

• Research Organization: Thomas Jefferson National Accelerator Facility, Newport News, VA (United States); Fermi National Accelerator Laboratory (FNAL), Batavia, IL (United States)
• Sponsoring Organization: USDOE Office of Science (SC), Nuclear Physics (NP)
• DOE Contract Number: AC05-06OR23177
• OSTI ID: 1905306
• Report Number(s): JLAB-ACP-21-3518; DOE/OR/23177-5662
• Country of Publication: United States
• Language: English