Effect of substrate temperature on the growth of Nb3Sn film on Nb by multilayer sputtering

Sayeed, Md Nizam; Pudasaini, Uttar; Reece, Charles E.; Eremeev, Grigory V.; Elsayed-Ali, Hani E.

doi:10.1016/j.tsf.2022.139569

Effect of substrate temperature on the growth of Nb₃Sn film on Nb by multilayer sputtering

Journal Article · Wed Nov 02 00:00:00 EDT 2022 · Thin Solid Films

DOI:https://doi.org/10.1016/j.tsf.2022.139569· OSTI ID:1897614

Sayeed, Md Nizam ^[1]; ^[2]; ^[2]; Eremeev, Grigory V. ^[3]; Elsayed-Ali, Hani E. ^[1]

Old Dominion University, Norfolk, VA (United States)
Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States)
Fermi National Accelerator Lab. (FNAL), Batavia, IL (United States)

Here, we report on the fabrication of niobium tin (Nb₃Sn) films by multilayer sequential sputtering on niobium at substrate temperatures ranging from room temperature to 250 °C. The multilayers were then annealed inside a separate vacuum furnace at 950 °C for 3 h. The material properties of the films were characterized by X-ray diffraction, scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and transmission electron microscopy. The superconducting properties of the films were studied by four-point probe resistivity measurements from room temperature to below the superconducting critical temperature T_c. The highest film T_c was 17.76 K, obtained when the multilayers were deposited at room temperature. When the deposition temperature was raised to 250 °C, a significant reduction in voids was achieved while the film's T_c was 17.58 K.

View Accepted Manuscript (DOE)

Research Organization:: Fermi National Accelerator Laboratory (FNAL), Batavia, IL (United States); Old Dominion Univ., Norfolk, VA (United States); Thomas Jefferson National Accelerator Facility, Newport News, VA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), High Energy Physics (HEP); USDOE Office of Science (SC), Nuclear Physics (NP)

Grant/Contract Number:: AC02-07CH11359; AC05-06OR23177; SC0022284

OSTI ID:: 1897614

Alternate ID(s):: OSTI ID: 1908234

Report Number(s):: DOE/OR/23177-5420; JLAB-ACC-21-3559; arXiv:2109.07066

Journal Information:: Thin Solid Films, Journal Name: Thin Solid Films Vol. 763; ISSN 0040-6090

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

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36 MATERIALS SCIENCE
43 PARTICLE ACCELERATORS
microstructure
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Effect of substrate temperature on the growth of Nb3Sn film on Nb by multilayer sputtering

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Effect of substrate temperature on the growth of Nb₃Sn film on Nb by multilayer sputtering