Effect of substrate temperature on the growth of Nb$$_3$$Sn film on Nb by multilayer sputtering

Journal Article · Wed Sep 15 04:00:00 EDT 2021 · TBD

OSTI ID:1832825

Sayeed, Md. Nizam ^[1]; Pudasaini, Uttar ^[2]; Reece, Charles E. ^[2]; Eremeev, Grigory V. ^[3]; Hani E., Elsayed-Ali ^[1]

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1. Old Dominion U.
2. Jefferson Lab
3. Fermilab

Nb3Sn films were fabricated by multilayer sequential sputtering on Nb substrates at substrate temperatures ranging from room temperature to 250 °C. The film material properties were characterized by X-ray diffraction, scanning electron microscopy, energy-dispersive X-ray spectroscopy, atomic force microscopy, and transmission electron microscopy. The films’ superconducting properties were studied by four-point probe resistivity measurements from room temperature to below the superconducting critical temperature Tc. The highest Tc was17.76 K, when the multilayers were deposited at room temperature. A superconducting Nb3Sn thin film with a smoother surface morphology but a lower Tc of 17.58 K was obtained on the film deposited at a substrate temperature of 250 °C.

• Research Organization: Thomas Jefferson National Accelerator Facility (TJNAF), Newport News, VA (United States); Fermi National Accelerator Laboratory (FNAL), Batavia, IL (United States)
• Sponsoring Organization: USDOE Office of Science (SC), High Energy Physics (HEP) (SC-25)
• DOE Contract Number: AC02-07CH11359
• OSTI ID: 1832825
• Report Number(s): FERMILAB-PUB-21-444-TD; arXiv:2109.07066; oai:inspirehep.net:1975199
• Journal Information: TBD, Journal Name: TBD
• Country of Publication: United States
• Language: English