skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Filament Formation in TaO x Thin Films for Memristor Device Application: Modeling Electron Energy Loss Spectra and Electron Transport

Journal Article · · Advanced Electronic Materials
 [1]; ORCiD logo [1];  [1];  [2];  [2];  [3];  [4];  [5];  [1]
  1. Air Force Research Laboratory Materials and Manufacturing Directorate Wright‐Patterson Air Force Base Dayton OH 45433 USA
  2. National Center for Electron Microscopy Molecular Foundry Lawrence Berkeley National Laboratory Berkeley CA 94720 USA
  3. Quantum Generative Materials LLC Cheyenne WY 82001 USA
  4. School of Electrical Computer and Energy Engineering Arizona State University Tempe AZ 85281 USA
  5. Air Force Research Laboratory Information Directorate Rome NY 13441 USA

Abstract Although understanding filament formation in oxide‐based memristive devices by theory has emerged, there are still fundamental unanswered questions. Importantly, for practical application of thin films the material in its amorphous state is to be considered, but mostly lacking so far, and details on sub‐stoichiometry are also scarce. To gain insight into the optical and electronic properties of sub‐stoichiometric amorphous tantalum oxide (TaO x ), the electron energy loss spectrum (EELS) of model systems is characterized theoretically and electron transport characteristics are analyzed in detail. Calculated blue‐shifts by increasing sub‐stoichiometry explained the measurements, potentially suggesting estimation of oxygen vacancy concentrations through EEL spectra. Electron transport results based on TaO x material models validated by EELS measurements show that oxygen vacancy filamentary paths are initiated at low bias upon increasing sub‐stoichiometry yet noting an interplay with the local amorphous structure. Contact resistances at interfaces of the TaO x switching layer and a tantalum scavenging layer or titanium nitride electrode are quantified, indicating the possibility for either oxygen vacancy‐ or metal cluster‐based conduction mechanisms at the interface. The computational work, combined with experimental characterization for validation, provides a basis for investigating effects of sub‐stoichiometry on filament formation in TaO x thin film memristive devices.

Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
Grant/Contract Number:
DE‐AC02‐05CH11231; AC02-05CH11231
OSTI ID:
1894172
Alternate ID(s):
OSTI ID: 1894173; OSTI ID: 1992472
Journal Information:
Advanced Electronic Materials, Journal Name: Advanced Electronic Materials Vol. 9 Journal Issue: 1; ISSN 2199-160X
Publisher:
Wiley Blackwell (John Wiley & Sons)Copyright Statement
Country of Publication:
United States
Language:
English

References (58)

Generalized Gradient Approximation Made Simple journal October 1996
Simulation of TaOx-based complementary resistive switches by a physics-based memristive model conference June 2014
Hybrid functionals based on a screened Coulomb potential journal May 2003
Memristor modeling: challenges in theories, simulations, and device variability journal January 2021
Synergistic Resistive Switching Mechanism of Oxygen Vacancies and Metal Interstitials in Ta 2 O 5 journal January 2016
Electrical conductivity in oxygen-deficient phases of tantalum pentoxide from first-principles calculations journal November 2013
Oxidation state and interfacial effects on oxygen vacancies in tantalum pentoxide journal February 2015
Density-functional study of bulk and surface properties of titanium nitride using different exchange-correlation functionals journal July 2000
From ultrasoft pseudopotentials to the projector augmented-wave method journal January 1999
Chemical Structure of Conductive Filaments in Tantalum Oxide Memristive Devices and Its Implications for the Formation Mechanism journal February 2022
Ab initio reflectance difference spectra of the bare and adsorbate covered Cu(110) surfaces journal July 2007
Density functional theory study of TiO 2 /Ag interfaces and their role in memristor devices journal June 2011
Electron correlation in semiconductors and insulators: Band gaps and quasiparticle energies journal October 1986
Extrinsic Dopant Effects on Oxygen Vacancy Formation Energies in ZrO2 with Implication for Memristive Device Performance journal March 2019
First principles study of oxygen vacancy defects in tantalum pentoxide journal November 2003
Application of the Quantum-Point-Contact Formalism to Model the Filamentary Conduction in Ta 2 O 5 -Based Resistive Switching Devices journal March 2022
Memristor-The missing circuit element journal January 1971
Using Dopants to Tune Oxygen Vacancy Formation in Transition Metal Oxide Resistive Memory journal May 2017
Phase separation in amorphous tantalum oxide from first principles journal July 2020
Density-functional method for nonequilibrium electron transport journal March 2002
Memristive switching mechanism for metal/oxide/metal nanodevices journal June 2008
Quantitative, Dynamic TaO x Memristor/Resistive Random Access Memory Model journal February 2020
Exploring local currents in molecular junctions journal February 2010
In situ observation of filamentary conducting channels in an asymmetric Ta2O5−x/TaO2−x bilayer structure journal September 2013
The missing memristor found journal May 2008
Role of atomistic structure in the stochastic nature of conductivity in substoichiometric tantalum pentoxide journal March 2016
Controlling the TiN Electrode Work Function at the Atomistic Level: A First Principles Investigation journal January 2020
Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set journal July 1996
Sub-nanosecond switching of a tantalum oxide memristor journal November 2011
Reactive sputtering of substoichiometric Ta2Ox for resistive memory applications
  • Stevens, James E.; Lohn, Andrew J.; Decker, Seth A.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 32, Issue 2, Article No. 021501 https://doi.org/10.1116/1.4828701
journal March 2014
Influence of the exchange screening parameter on the performance of screened hybrid functionals journal December 2006
Electronic structure of β-Ta films from X-ray photoelectron spectroscopy and first-principles calculations journal March 2019
On the Theory of Dispersion of X-Rays journal January 1926
Ab initio pseudopotentials for electronic structure calculations of poly-atomic systems using density-functional theory journal June 1999
Non-metallic dopant modulation of conductivity in substoichiometric tantalum pentoxide: A first-principles study journal June 2017
Materials selection for oxide-based resistive random access memories journal December 2014
Oxygen vacancy effects in HfO2-based resistive switching memory: First principle study journal August 2016
New Method for Calculating the One-Particle Green's Function with Application to the Electron-Gas Problem journal August 1965
Smooth Interfacial Scavenging for Resistive Switching Oxide via the Formation of Highly Uniform Layers of Amorphous TaOx journal February 2018
Evaluating tantalum oxide stoichiometry and oxidation states for optimal memristor performance
  • Brumbach, Michael T.; Mickel, Patrick R.; Lohn, Andrew J.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 32, Issue 5 https://doi.org/10.1116/1.4893929
journal September 2014
An empirical model for silver tantalate journal May 2013
Band alignment between Ta2O5 and metals for resistive random access memory electrodes engineering journal February 2013
A high-energy electron scattering study of the electronic structure and elemental composition of O-implanted Ta films used for the fabrication of memristor devices journal August 2013
Mechanistic Analysis of Oxygen Vacancy-Driven Conductive Filament Formation in Resistive Random Access Memory Metal/NiO/Metal Structures journal February 2018
Redox-Based Resistive Switching Memories - Nanoionic Mechanisms, Prospects, and Challenges journal July 2009
Linear optical properties in the projector-augmented wave methodology journal January 2006
Photoelectron diffraction determination of the geometry of a clean metal surface: Ta(100) journal September 1989
Origin of the Ultra-nonlinear Switching Kinetics in Oxide-Based Resistive Switches journal September 2011
A physical model of switching dynamics in tantalum oxide memristive devices journal June 2013
Reduction of the forming voltage through tailored oxygen non-stoichiometry in tantalum oxide ReRAM devices journal July 2018
Diffusion of oxygen in amorphous tantalum oxide journal May 2019
Spatial Variation of Currents and Fields Due to Localized Scatterers in Metallic Conduction journal July 1957
A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta2O5−x/TaO2−x bilayer structures journal July 2011
Review of memristor devices in neuromorphic computing: materials sciences and device challenges journal September 2018
Characteristics and transport mechanisms of triple switching regimes of TaOx memristor journal April 2017
QuantumATK: an integrated platform of electronic and atomic-scale modelling tools journal October 2019
Resistive switching memories based on metal oxides: mechanisms, reliability and scaling journal May 2016
Resistive switching materials for information processing journal January 2020