Single-beam ion source enhanced growth of transparent conductive thin films

Tran, Thanh; Kim, Young; Baule, Nina; Shrestha, Maheshwar; Zheng, Bocong; Wang, Keliang; Schuelke, Thomas; Fan, Qi Hua

doi:10.1088/1361-6463/ac7f01

Single-beam ion source enhanced growth of transparent conductive thin films

Journal Article · Tue Jul 19 00:00:00 EDT 2022 · Journal of Physics. D, Applied Physics

DOI:https://doi.org/10.1088/1361-6463/ac7f01· OSTI ID:1880845

Tran, Thanh ^[1]; Kim, Young ^[2]; Baule, Nina ^[3]; Shrestha, Maheshwar ^[4]; ^[3]; Wang, Keliang ^[3]; Schuelke, Thomas ^[3]; ^[2]

Michigan State Univ., East Lansing, MI (United States); Scion Plasma LLC
Michigan State Univ., East Lansing, MI (United States)
Fraunhofer USA Center Midwest, East Lansing, MI (United States)
Scion Plasma LLC, East Lansing, MI (United States)

A single-beam ion source was developed and used in combination with magnetron sputtering to modulate the film microstructure. The ion source emits a single beam of ions that interact with the deposited film and simultaneously enhances the magnetron discharge. The magnetron voltage can be adjusted over a wide range, from approximately 240 to 130 V, as the voltage of the ion source varies from 0 to 150 V, while the magnetron current increases accordingly. The low-voltage high-current magnetron discharge enables a 'soft sputtering mode', which is beneficial for thin-film growth. Indium tin oxide (ITO) thin films were deposited at room temperature using a combined single-beam ion source and magnetron sputtering. Furthermore, the ion beam resulted in the formation of polycrystalline ITO thin films with significantly reduced resistivity and surface roughness. Single-beam ion-source-enhanced magnetron sputtering has many potential applications in which low-temperature growth of thin films is required, such as coatings for organic solar cells.

Research Organization:: Scion Plasma LLC, East Lansing, MI (United States)

Sponsoring Organization:: National Science Foundation; USDOE

Grant/Contract Number:: EE0009018

OSTI ID:: 1880845

Report Number(s):: DOE-ScionPlasma-EE0009018; 1724941

Journal Information:: Journal of Physics. D, Applied Physics, Journal Name: Journal of Physics. D, Applied Physics Journal Issue: 39 Vol. 55; ISSN 0022-3727

Publisher:: IOP PublishingCopyright Statement

Country of Publication:: United States

Language:: English

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36 MATERIALS SCIENCE
high rate deposition
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low temperature
magnetron discharge
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Single-beam ion source enhanced growth of transparent conductive thin films

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