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Ferroionic states in ferroelectric thin films

Journal Article · · Physical Review. B
 [1];  [2];  [3];  [4]
  1. NAS of Ukraine, Kyiv (Ukraine). Inst. of Physics; NAS of Ukraine, Kyiv (Ukraine). Bogolyubov Institute for Theoretical Physics
  2. NAS of Ukraine, Kyiv (Ukraine). Inst. of Physics; NAS of Ukraine, Kyiv (Ukraine). Institute for Problems of Materials Science
  3. NAS of Ukraine, Kyiv (Ukraine). Inst. of Physics
  4. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
The electric coupling between surface ions and bulk ferroelectricity gives rise to a continuum of mixed states in ferroelectric thin films, exquisitely sensitive to temperature and external factors, such as applied voltage and oxygen pressure. Here we develop the comprehensive analytical description of these coupled ferroelectric and ionic (ferroionic) states by combining the Ginzburg-Landau-Devonshire description of the ferroelectric properties of the film with Langmuir adsorption model for the electrochemical reaction at the film surface. We explore the thermodynamic and kinetic characteristics of the ferroionic states as a function of temperature, film thickness, and external electric potential. These studies provide a new insight into mesoscopic properties of ferroelectric thin films, whose surface is exposed to chemical environment as screening charges supplier.
Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
Sponsoring Organization:
USDOE; USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division
Grant/Contract Number:
AC05-00OR22725
OSTI ID:
1870268
Alternate ID(s):
OSTI ID: 1356729
Journal Information:
Physical Review. B, Journal Name: Physical Review. B Journal Issue: 19 Vol. 95; ISSN 2469-9950
Publisher:
American Physical Society (APS)Copyright Statement
Country of Publication:
United States
Language:
English

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