Ultralow 0.034 dB/m loss wafer-scale integrated photonics realizing 720 million Q and 380 μW threshold Brillouin lasing

Liu, Kaikai; Jin, Naijun; Cheng, Haotian; Chauhan, Nitesh; Puckett, Matthew W.; Nelson, Karl D.; Behunin, Ryan O.; Rakich, Peter T.; Blumenthal, Daniel J.

doi:10.1364/OL.454392

Ultralow 0.034 dB/m loss wafer-scale integrated photonics realizing 720 million Q and 380 μW threshold Brillouin lasing

Journal Article · Thu Mar 31 00:00:00 EDT 2022 · Optics Letters

DOI:https://doi.org/10.1364/OL.454392· OSTI ID:1860420

; Jin, Naijun; Cheng, Haotian; Chauhan, Nitesh; Puckett, Matthew W.; Nelson, Karl D.; Behunin, Ryan O.; Rakich, Peter T.;

We demonstrate 0.034 dB/m loss waveguides in a 200-mm wafer-scale, silicon nitride (Si ₃ N ₄ ) CMOS-foundry-compatible integration platform. We fabricate resonators that measure up to a 720 million intrinsic Q resonator at 1615 nm wavelength with a 258 kHz intrinsic linewidth. This resonator is used to realize a Brillouin laser with an energy-efficient 380 µW threshold power. The performance is achieved by reducing scattering losses through a combination of single-mode TM waveguide design and an etched blanket-layer low-pressure chemical vapor deposition (LPCVD) 80 nm Si ₃ N ₄ waveguide core combined with thermal oxide lower and tetraethoxysilane plasma-enhanced chemical vapor deposition (TEOS–PECVD) upper oxide cladding. This level of performance will enable photon preservation and energy-efficient generation of the spectrally pure light needed for photonic integration of a wide range of future precision scientific applications, including quantum, precision metrology, and optical atomic clocks.

View Accepted Manuscript (Publisher)

Sponsoring Organization:: USDOE Advanced Research Projects Agency - Energy (ARPA-E)

Grant/Contract Number:: AR0001042

OSTI ID:: 1860420

Journal Information:: Optics Letters, Journal Name: Optics Letters Journal Issue: 7 Vol. 47; ISSN OPLEDP; ISSN 0146-9592

Publisher:: Optical Society of AmericaCopyright Statement

Country of Publication:: United States

Language:: English

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