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Mitigating photorefractive effect in thin-film lithium niobate microring resonators

Journal Article · · Optics Express
DOI:https://doi.org/10.1364/OE.418877· OSTI ID:1842376

Thin-film lithium niobate is an attractive integrated photonics platform due to its low optical loss and favorable optical nonlinear and electro-optic properties. However, in applications such as second harmonic generation, frequency comb generation, and microwave-to-optics conversion, the device performance is strongly impeded by the photorefractive effect inherent in thin-film lithium niobate. In this paper, we show that the dielectric cladding on a lithium niobate microring resonator has a significant influence on the photorefractive effect. By removing the dielectric cladding layer, the photorefractive effect in lithium niobate ring resonators can be effectively mitigated. Our work presents a reliable approach to control the photorefractive effect on thin-film lithium niobate and will further advance the performance of integrated classical and quantum photonic devices based on thin-film lithium niobate.

Research Organization:
Yale Univ., New Haven, CT (United States)
Sponsoring Organization:
Army Research Office (ARO); National Science Foundation (NSF); USDOE; USDOE Office of Science (SC)
Grant/Contract Number:
SC0019406
OSTI ID:
1842376
Alternate ID(s):
OSTI ID: 1853216
Journal Information:
Optics Express, Journal Name: Optics Express Journal Issue: 4 Vol. 29; ISSN 1094-4087; ISSN OPEXFF
Publisher:
Optical Society of AmericaCopyright Statement
Country of Publication:
United States
Language:
English

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