Surface relaxation and photoelectric absorption effects on synchrotron X-ray topographic images of dislocations lying on the basal plane in off-axis 4H-SiC crystals
Journal Article
·
· Materials Science and Engineering. B, Solid-State Materials for Advanced Technology
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- AC02-06CH11357
- OSTI ID:
- 1815211
- Journal Information:
- Materials Science and Engineering. B, Solid-State Materials for Advanced Technology, Journal Name: Materials Science and Engineering. B, Solid-State Materials for Advanced Technology Vol. 271 Journal Issue: C; ISSN 0921-5107
- Publisher:
- ElsevierCopyright Statement
- Country of Publication:
- Netherlands
- Language:
- English
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