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Pseudo-gray-scale halftone gratings for shearing and Hartmann wavefront sensors

Journal Article · · Optics Letters
DOI:https://doi.org/10.1364/ol.417408· OSTI ID:1811507
 [1]
  1. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Now in use on x-ray beamlines worldwide, shearing interferometry and Hartmann wavefront sensing provide effective feedback for measuring and optimizing high-quality beams. Conventionally, both approaches spatially modulate the beam properties (amplitude or phase) using two-tone, binary patterns, leading to deleterious diffraction effects that must be mitigated. In shearing, the presence of multiple diffraction orders affects measurement near boundaries. In Hartmann, diffraction limits the measurement point density. We demonstrate that the use of pseudo-gray-scale halftone patterns in the diffracting elements can improve the performance of both techniques.
Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE; USDOE Office of Science (SC)
Grant/Contract Number:
AC02-05CH11231
OSTI ID:
1811507
Alternate ID(s):
OSTI ID: 1842370
Journal Information:
Optics Letters, Journal Name: Optics Letters Journal Issue: 4 Vol. 46; ISSN 0146-9592
Publisher:
Optical Society of America (OSA)Copyright Statement
Country of Publication:
United States
Language:
English

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