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Title: Metal Nitride Electrode Stress and Chemistry Effects on Phase and Polarization Response in Ferroelectric Hf0.5Zr0.5O2 Thin Films

Journal Article · · Advanced Materials Interfaces
ORCiD logo [1];  [2]; ORCiD logo [3]; ORCiD logo [2];  [2];  [1]; ORCiD logo [1]; ORCiD logo [2]; ORCiD logo [2]; ORCiD logo [2]; ORCiD logo [1]; ORCiD logo [1]
  1. Univ. of Virginia, Charlottesville, VA (United States)
  2. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
  3. Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

Abstract not provided.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States); Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA); USDOE Office of Science (SC); National Science Foundation (NSF)
Grant/Contract Number:
AC05-00OR22725; NA0003525; DMR-1626201; DGE-1842490; AC04-94AL85000; DE‐NA‐0003525
OSTI ID:
1779120
Alternate ID(s):
OSTI ID: 1781573; OSTI ID: 1785766
Report Number(s):
SAND-2021-5021J
Journal Information:
Advanced Materials Interfaces, Vol. 8, Issue 10; ISSN 2196-7350
Publisher:
Wiley-VCHCopyright Statement
Country of Publication:
United States
Language:
English

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