Modulation of Photoinduced Iodine Expulsion in Mixed Halide Perovskites with Electrochemical Bias
Journal Article
·
· Journal of Physical Chemistry Letters
- Univ. of Notre Dame, IN (United States). Notre Dame Radiation Lab.; University of Notre Dame
- Univ. of Notre Dame, IN (United States). Notre Dame Radiation Lab.
- Univ. of Notre Dame, IN (United States)
Hole trapping at iodine (I) sites in MAPbBr1.5I1.5 mixed halide perovskites (MHP) is responsible for iodine migration and its eventual expulsion into solution. We have now modulated the photoinduced iodine expulsion in MHP through an externally applied electrochemical bias. At positive potentials, electron extraction at TiO2/MHP interfaces becomes efficient, leading to hole buildup within MHP films. This improved charge separation, in turn, favors iodine migration as evident from the increased apparent rate constant of iodine expulsion (kexpulsion = 0.0030 s–1). Conversely, at negative potentials (-0.3 V vs Ag/AgCl) electron–hole recombination is facilitated within MHP, slowing down iodine expulsion by an order of magnitude (kexpulsion = 0.00018 s–1). The tuning of the EFermi level through external bias modulates electron extraction at the TiO2/MHP interface and indirectly controls the buildup of holes, ultimately inducing iodine migration/expulsion. Suppressing iodine migration in perovskite solar cells is important for attaining greater stability since they operate under internal electrical bias.
- Research Organization:
- Univ. of Notre Dame, IN (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Chemical Sciences, Geosciences & Biosciences Division
- Grant/Contract Number:
- FC02-04ER15533; SC0014334
- OSTI ID:
- 1774774
- Alternate ID(s):
- OSTI ID: 1830770
OSTI ID: 1909219
- Journal Information:
- Journal of Physical Chemistry Letters, Journal Name: Journal of Physical Chemistry Letters Journal Issue: 10 Vol. 12; ISSN 1948-7185
- Publisher:
- American Chemical SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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OSTI ID:1830795