Coating Thickness Controls Crystallinity and Enables Homoepitaxial Growth of Ultra-Thin-Channel Blade-Coated In 2 O 3 Transistors

Kirmani, A; Chen, H.; Stafford, C.; Bittle, E.; Richter, L.

doi:10.1002/aelm.202000354

Title: Coating Thickness Controls Crystallinity and Enables Homoepitaxial Growth of Ultra-Thin-Channel Blade-Coated In 2 O 3 Transistors

Journal Article · Sat Jan 01 00:00:00 EST 2022 · Advanced Electronic Materials

DOI:https://doi.org/10.1002/aelm.202000354· OSTI ID:1760483

Kirmani, A; Chen, H.; Stafford, C.; Bittle, E.; Richter, L.

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Research Organization:: Brookhaven National Lab. (BNL), Upton, NY (United States)

Sponsoring Organization:: ~OTHER

DOE Contract Number:: SC0012704

OSTI ID:: 1760483

Report Number(s):: BNL-220831-2021-JACI

Journal Information:: Advanced Electronic Materials, Vol. 6, Issue 11

Publisher:: Wiley

Country of Publication:: United States

Language:: English

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Title: Coating Thickness Controls Crystallinity and Enables Homoepitaxial Growth of Ultra-Thin-Channel Blade-Coated In 2 O 3 Transistors

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